公开(公告)号：US07105840B2

公开(公告)日：2006-09-12

申请号：US11049913

申请日：2005-02-03

申请人： Klaus Becker ,  Werner Baer ,  Klaus Petry

发明人： Klaus Becker ,  Werner Baer ,  Klaus Petry

IPC分类号： G21K5/10 ,  H01J37/08

CPC分类号： H01J37/08 ,  H01J27/08 ,  H01J37/3171

摘要： An ion implanter having a source, a workpiece support and a transport system for delivering ions from the source to an ion implantation chamber that contains the workpiece support. The ion source has an arc chamber for ionizing a source material routed into the arc chamber that defines an exit aperture for routing ions to the transport system and including an arc chamber flange attached to the arc chamber and including a first surface that defines a gas inlet which accepts gas from a source and a gas outlet which opens into the arc chamber. An arc chamber support includes a support flange having a conforming surface that sealingly engages the first surface of arc chamber flange at a region of the gas inlet and further includes a throughpassage that aligns with the gas inlet. A gas supply line routes gas from a gas source through the throughpassage of the support flange and into the gas inlet of said arc chamber flange.

摘要翻译： 一种离子注入机，其具有源，工件支撑和用于将离子从源输送到包含工件支撑件的离子注入室的输送系统。 离子源具有电弧室，用于电离导入电弧室的源材料，其限定用于将离子引导到输送系统的出口孔，并且包括附接到电弧室的电弧室凸缘，并且包括限定气体入口的第一表面 其接收来自源的气体和通向电弧室的气体出口。 电弧室支撑件包括具有适配表面的支撑凸缘，其密封地接合在气体入口的区域处的电弧室凸缘的第一表面，并且还包括与气体入口对准的通道。 气体供应管线将来自气体源的气体通过支撑凸缘的通孔引入到所述电弧室凸缘的气体入口中。

公开(公告)号：US20060169921A1

公开(公告)日：2006-08-03

申请号：US11049913

申请日：2005-02-03

申请人： Klaus Becker ,  Werner Baer ,  Klaus Petry

发明人： Klaus Becker ,  Werner Baer ,  Klaus Petry

IPC分类号： H01J37/317 ,  H01J37/08

CPC分类号： H01J37/08 ,  H01J27/08 ,  H01J37/3171

摘要： An ion implanter having a source, a workpiece support and a transport system for delivering ions from the source to an ion implantation chamber that contains the workpiece support. The ion source has an arc chamber for ionizing a source material routed into the arc chamber that defines an exit aperture for routing ions to the transport system and including an arc chamber flange attached to the arc chamber and including a first surface that defines a gas inlet which accepts gas from a source and a gas outlet which opens into the arc chamber. An arc chamber support includes a support flange having a conforming surface that sealingly engages the first surface of arc chamber flange at a region of the gas inlet and further includes a throughpassage that aligns with the gas inlet. A gas supply line routes gas from a gas source through the throughpassage of the support flange and into the gas inlet of said arc chamber flange.

摘要翻译： 一种离子注入机，其具有源，工件支撑和用于将离子从源输送到包含工件支撑件的离子注入室的输送系统。 离子源具有电弧室，用于电离导入电弧室的源材料，其限定用于将离子引导到输送系统的出口孔，并且包括附接到电弧室的电弧室凸缘，并且包括限定气体入口的第一表面 其接收来自源的气体和通向电弧室的气体出口。 电弧室支撑件包括具有适配表面的支撑凸缘，其密封地接合在气体入口的区域处的电弧室凸缘的第一表面，并且还包括与气体入口对准的通道。 气体供应管线将来自气体源的气体通过支撑凸缘的通孔引入到所述电弧室凸缘的气体入口中。