公开(公告)号：US20130233401A1

公开(公告)日：2013-09-12

申请号：US13846007

申请日：2013-03-18

Applicant: Mariusch GREGOR ,  John W. LANE

Inventor： Mariusch GREGOR ,  John W. LANE

IPC: F17D3/00

CPC classification number: F17D3/00 ,  G01F25/003 ,  G01F25/0053 ,  Y10T137/0324 ,  Y10T137/0363 ,  Y10T137/0379 ,  Y10T137/0402 ,  Y10T137/2524 ,  Y10T137/2529

Abstract: Embodiments of the present invention generally relate to methods of controlling gas flow in etching chambers. The methods generally include splitting a single process gas supply source into multiple inputs of separate process chambers, such that each chamber processes substrates under uniform processing conditions. The method generally includes using a mass flow controller as a reference for calibrating a flow ratio controller. A span correction factor may be determined to account for the difference between the actual flow and the measured flow through the flow ratio controller. The span correction factors may be used to determine corrected set points for each channel of the flow controller using equations provided herein. Furthermore, the set points of the flow ratio controller may be made gas-independent using additional equations provided herein.

Abstract translation: 本发明的实施例一般涉及控制蚀刻室中的气流的方法。 这些方法通常包括将单个工艺气体供应源分离成单独的处理室的多个输入，使得每个室在均匀的处理条件下处理衬底。 该方法通常包括使用质量流量控制器作为校准流量比控制器的参考。 可以确定跨度校正因子以解决通过流量比控制器的实际流量和测量流量之间的差异。 跨度校正因子可以用于使用本文提供的等式来确定流量控制器的每个通道的校正设定点。 此外，可以使用本文提供的附加方程式将流量比控制器的设定点与气体无关。

公开(公告)号：US20120067829A1

公开(公告)日：2012-03-22

申请号：US12885277

申请日：2010-09-17

Applicant: John W. LANE ,  Sarah Ferrari

Inventor： John W. LANE ,  Sarah Ferrari

IPC: C02F9/00 ,  C02F1/68

CPC classification number: C02F1/687 ,  C02F1/008 ,  C02F2209/006 ,  C02F2209/40 ,  C02F2209/44 ,  C02F2303/02 ,  C02F2303/08 ,  C02F2303/20 ,  C02F2303/22 ,  Y10T137/4891

Abstract: A water treatment feed device includes a hopper and a receptacle. The hopper has a granule-receiving compartment defined by an upper hopper portion and a lower V-shaped hopper portion connected to the upper hopper portion. The lower V-shaped hopper portion is fabricated from a porous material having a plurality of pores sized to at least substantially retain conventional water treatment granules therein. The receptacle has a water-receiving compartment with a weir disposed therein to divide the water-receiving compartment into a water inlet sub-compartment and a water outlet sub-compartment with the water inlet sub-compartment sized to receive the hopper loaded with conventional water treatment granules. A water treatment feed system and a method for dissolving conventional water treatment granules in water are also described.

Abstract translation: 水处理进料装置包括料斗和容器。 料斗具有由上料斗部分和连接到上料斗部分的下V形料斗部分限定的颗粒容纳室。 下部V形料斗部分由多孔材料制成，该多孔材料具有多个孔，其大小至少基本上保持其中常规的水处理颗粒。 该容器具有一个收容室，其中设置有一个堰，用于将收水隔室分成一个进水子室和一个出水子室，其中进水分隔室的尺寸适于容纳装有常规水的料斗 治疗颗粒。 还描述了水处理进料系统和将常规水处理颗粒溶解在水中的方法。