公开(公告)号：US09372399B2

公开(公告)日：2016-06-21

申请号：US13812459

申请日：2011-07-21

申请人： Martinus Bernardus Van Der Mark ,  Vadim Yevgenyevich Banine ,  Andre Bernardus Jeunink ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Emiel Andreas Godefridus Peeters ,  Johan Hendrik Klootwijk ,  Roelof Koole ,  Christianus Martinus Van Heesch ,  Ruediger Guenter Mauczok ,  Jacobus Bernardus Giesbers

发明人： Martinus Bernardus Van Der Mark ,  Vadim Yevgenyevich Banine ,  Andre Bernardus Jeunink ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Emiel Andreas Godefridus Peeters ,  Johan Hendrik Klootwijk ,  Roelof Koole ,  Christianus Martinus Van Heesch ,  Ruediger Guenter Mauczok ,  Jacobus Bernardus Giesbers

IPC分类号： G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.

摘要翻译： 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。

公开(公告)号：US20130120725A1

公开(公告)日：2013-05-16

申请号：US13812459

申请日：2011-07-21

申请人： Martinus Bernardus Van Der Mark ,  Vadim Yevgenyevich Banine ,  Andre Bernardus Jeunink ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Emiel Andreas Godefridus Peeters ,  Johan Hendrik Klootwijk ,  Roelof Koole ,  Christianus Martinus Van Heesch ,  Ruediger Guenter Mauczok ,  JAcobus Bernardus Giesbers

发明人： Martinus Bernardus Van Der Mark ,  Vadim Yevgenyevich Banine ,  Andre Bernardus Jeunink ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Emiel Andreas Godefridus Peeters ,  Johan Hendrik Klootwijk ,  Roelof Koole ,  Christianus Martinus Van Heesch ,  Ruediger Guenter Mauczok ,  JAcobus Bernardus Giesbers

IPC分类号： G03F7/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.

摘要翻译： 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。