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公开(公告)号：US09372399B2
公开(公告)日：2016-06-21
申请号：US13812459
申请日：2011-07-21
申请人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , Jacobus Bernardus Giesbers
发明人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , Jacobus Bernardus Giesbers
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.
摘要翻译： 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。
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公开(公告)号：US20130120725A1
公开(公告)日：2013-05-16
申请号：US13812459
申请日：2011-07-21
申请人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , JAcobus Bernardus Giesbers
发明人： Martinus Bernardus Van Der Mark , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Johan Frederik Dijksman , Sander Frederik Wuister , Emiel Andreas Godefridus Peeters , Johan Hendrik Klootwijk , Roelof Koole , Christianus Martinus Van Heesch , Ruediger Guenter Mauczok , JAcobus Bernardus Giesbers
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography method is disclosed for reducing a difference between an intended topography and an actual topography arising from a part of a patterned layer of fixed imprintable medium. The method involves imprinting an imprint lithography template into a layer of flowable imprintable medium to form a patterned layer in the imprintable medium, and fixing the imprintable medium to form a patterned layer of fixed imprintable medium. Local excitation is applied to the part of the patterned layer to adjust a chemical reaction in the part of the patterned layer to reduce the difference between the intended topography and the actual topography arising from the part of the fixed patterned layer of imprintable medium when this is subsequently used as a resist for patterning the substrate. An imprint medium suitable for imprint lithography with the method is also disclosed.
摘要翻译： 公开了一种压印光刻方法，用于减少由固定的可打印介质的图案层的一部分产生的预期形貌和实际形貌之间的差异。 该方法包括将压印光刻模板压印到可流动的可压印介质层中以在可压印介质中形成图案化层，并固定可压印介质以形成固定可压印介质的图案化层。 局部激发被施加到图案化层的部分以调整图案化层的部分中的化学反应，以减少所期望的形貌与由可压印介质的固定图案化层的部分产生的实际形貌之间的差异，当这是 随后用作图案化基板的抗蚀剂。 还公开了适用于该方法的压印光刻的压印介质。
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公开(公告)号：US20110001254A1
公开(公告)日：2011-01-06
申请号：US12820492
申请日：2010-06-22
申请人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
发明人： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
CPC分类号： G03F9/7042 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
摘要翻译： 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
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4.发明申请METHODS FOR PROVIDING PATTERNED ORIENTATION TEMPLATES FOR SELF-ASSEMBLABLE POLYMERS FOR USE IN DEVICE LITHOGRAPHY 审中-公开提供用于自组装聚合物的图案方向模板的方法用于器件平台的使用公开(公告)号：US20130266727A1
公开(公告)日：2013-10-10
申请号：US13994426
申请日：2011-12-09
申请人： Emiel Peeters , Wilhelmus Sebastianus Marcus Maria Ketelaars , Johan Frederik Dijksman , Sander Frederik Wuister , Roelof Koole , Christianus Martinus Van Heesch
发明人： Emiel Peeters , Wilhelmus Sebastianus Marcus Maria Ketelaars , Johan Frederik Dijksman , Sander Frederik Wuister , Roelof Koole , Christianus Martinus Van Heesch
IPC分类号： C30B19/12
CPC分类号： C30B19/12 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.
摘要翻译： 公开了一种方法，其涉及在衬底上形成化学外延或者石墨电极特征之后，但在自组装聚合物的沉积和取向之前，将中性取向模板层沉积到衬底上。 取向层被布置成与基底结合，但不具有某些特征，使得其可以容易地通过真空或用有机溶剂漂洗除去。 中性取向层具有与自组装聚合物中的嵌段相符的化学亲和力，使得不同类型的块润湿中性取向层，使得自组装聚合物中的畴可以沿着衬底表面并排， 界面垂直于衬底表面。 所得到的对准和取向的自组装聚合物本身可以用作衬底的器件光刻的抗蚀剂。
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公开(公告)号：US10538859B2
公开(公告)日：2020-01-21
申请号：US13994426
申请日：2011-12-09
申请人： Emiel Peeters , Wilhelmus Sebastianus Marcus Maria Ketelaars , Johan Frederik Dijksman , Sander Frederik Wuister , Roelof Koole , Christianus Martinus Van Heesch
发明人： Emiel Peeters , Wilhelmus Sebastianus Marcus Maria Ketelaars , Johan Frederik Dijksman , Sander Frederik Wuister , Roelof Koole , Christianus Martinus Van Heesch
IPC分类号： C30B19/12
摘要： A method is disclosed involving depositing a neutral orientation template layer onto a substrate after formation of chemical epitaxy or graphoepitaxy features on the substrate, but before deposition and orientation of a self-assemblable polymer. The orientation layer is arranged to bond with the substrate but not with certain features, so that it may be easily removed by vacuum or rinsing with organic solvent. The neutral orientation layer has a chemical affinity to match that of blocks in the self-assemblable polymer so that blocks of differing types wet the neutral orientation layer so that domains in the self-assembled polymer may lie side by side along the substrate surface, with interfaces normal to the substrate surface. The resulting aligned and oriented self-assembled polymer may itself be used as a resist for device lithography of the substrate.
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公开(公告)号：US08961801B2
公开(公告)日：2015-02-24
申请号：US12869381
申请日：2010-08-26
申请人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
发明人： Sander Frederik Wuister , Vadim Yevgenyevich Banine , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Jeroen Herman Lammers , Roelof Koole
CPC分类号： B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
摘要翻译： 在一个实施例中，提供了压印光刻方法，其包括在衬底的第一区域上提供第一量的可压印介质，当固定时，第一量的可压印介质具有第一蚀刻速率; 以及在所述基板的第二不同区域上提供第二量的可压印介质，所述第二量的可压印介质在固定时具有第二不同的蚀刻速率。
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公开(公告)号：US08743361B2
公开(公告)日：2014-06-03
申请号：US13098759
申请日：2011-05-02
申请人： Johan Frederik Dijksman , Arie Jeffrey Den Boef , Sander Frederik Wuister , Martinus Bernardus Van Der Mark
发明人： Johan Frederik Dijksman , Arie Jeffrey Den Boef , Sander Frederik Wuister , Martinus Bernardus Van Der Mark
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7042 , G03F9/7049 , G03F9/7076
摘要： A method of aligning a substrate and an imprint template is disclosed. The method includes directing an alignment radiation beam towards an imprint template alignment mark and an adjacent substrate alignment mark, the imprint template alignment mark and the substrate alignment mark each including a grating which extends in a first direction and a grating which extends in a second direction, providing relative movement between the imprint template and the substrate in the first direction and in the second direction, using an intensity detector to detect the intensity of alignment radiation redirected in the zero-order direction by the imprint template alignment mark and the substrate alignment mark during the relative movement in the first direction and in the second direction, and determining an aligned position of the imprint template alignment mark and the substrate alignment mark based upon the detected intensity.
摘要翻译： 公开了一种对准衬底和压印模板的方法。 该方法包括将对准辐射束引向印模模板对准标记和相邻的衬底对准标记，印模模板对准标记和衬底对准标记各自包括在第一方向上延伸的光栅和沿第二方向延伸的光栅 使用强度检测器，通过压印模板对准标记和基板对准标记来检测在零级方向上重定向的对准辐射的强度，在第一方向和第二方向上提供压印模板和基板之间的相对移动 在第一方向和第二方向的相对移动期间，基于检测到的强度确定压印模板对准标记和基板对准标记的对准位置。
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公开(公告)号：US20140299575A1
公开(公告)日：2014-10-09
申请号：US14124213
申请日：2012-06-07
申请人： Aurelie Marie Andree Brizard , Wilhelmus Sebastianus Marcus Maria Ketelaars , Sander Frederik Wuister , Roelof Koole , Emiel Peeters , Christianus Martinus Van Heesch , Henri Marie Joseph Boots , Thanh Trung Nguyen
发明人： Aurelie Marie Andree Brizard , Wilhelmus Sebastianus Marcus Maria Ketelaars , Sander Frederik Wuister , Roelof Koole , Emiel Peeters , Christianus Martinus Van Heesch , Henri Marie Joseph Boots , Thanh Trung Nguyen
IPC分类号： G03F7/00 , C08F299/04 , C08F299/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C08F299/02 , C08F299/04 , H01L51/0043
摘要： A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than TOD, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.
摘要翻译： BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于TOD的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键 相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。 包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段 当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。
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公开(公告)号：US08529823B2
公开(公告)日：2013-09-10
申请号：US12891422
申请日：2010-09-27
申请人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
发明人： Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Andre Bernardus Jeunink , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7003 , G03F9/7049 , G03F9/7076
摘要： A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.
摘要翻译： 公开了一种使用压印模板上的对准光栅和衬底上的对准光栅来确定压印模板和衬底之间的偏移的方法。 该方法包括使压印模板对准光栅和衬底对准光栅足够靠近在一起，使得它们形成复合光栅，将复合光栅的对准辐射束引导，同时调制压印模板和衬底的相对位置，检测强度 从复合光栅反射的对准辐射，并通过分析检测强度的调制来确定偏移。
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公开(公告)号：US09285676B2
公开(公告)日：2016-03-15
申请号：US14124213
申请日：2012-06-07
申请人： Aurelie Marie Andree Brizard , Wilhelmus Sebastianus Marcus Maria Ketelaars , Sander Frederik Wuister , Roelof Koole , Emiel Peeters , Christianus Martinus Van Heesch , Henri Marie Joseph Boots , Thanh Trung Nguyen
发明人： Aurelie Marie Andree Brizard , Wilhelmus Sebastianus Marcus Maria Ketelaars , Sander Frederik Wuister , Roelof Koole , Emiel Peeters , Christianus Martinus Van Heesch , Henri Marie Joseph Boots , Thanh Trung Nguyen
IPC分类号： G03F7/11 , G03F7/00 , H01L51/00 , C08F299/02 , C08F299/04 , B82Y10/00 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , C08F299/02 , C08F299/04 , H01L51/0043
摘要： A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than TOD, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.
摘要翻译： BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于TOD的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键 相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。 包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段 当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。
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