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公开(公告)号:US06916400B2
公开(公告)日:2005-07-12
申请号:US09983853
申请日:2001-10-26
CPC分类号: B01J19/126 , B01D53/32 , B01D2259/806 , B01D2259/818 , B01J19/088 , B01J2219/0871 , B01J2219/0894 , B01J2219/1215 , B01J2219/1236 , B01J2219/1269 , B01J2219/1281 , B01J2219/1284 , B01J2219/1293 , H01J37/32192 , H05H1/30
摘要: Provided is a device for the microwave-sustained plasma treatment of gases, which comprises a hollow structure forming a waveguide intended to be connected to a microwave generator, and means for making the gas to be treated flow through the said structure in a region in which the amplitude of the electric field associated with the incident wave is high. The means for making the gas flow comprise a plasma torch for producing a plasma in the gas. The torch comprises an injector made of an electrically conducting material mounted on a first large face of the said structure and extending so as to project through an orifice made in a second large face opposite the said first large face. A gap for passage of the incident waves lies around the injector.
摘要翻译: 提供了一种用于微波持续等离子体处理气体的装置,其包括形成用于连接到微波发生器的波导的中空结构,以及用于使待处理气体流过所述结构的装置,其中 与入射波相关的电场的幅度较大。 用于制造气流的装置包括用于在气体中产生等离子体的等离子体焰炬。 所述手电筒包括由导电材料制成的注射器,所述注射器安装在所述结构的第一大面上并且延伸以突出穿过与所述第一大面相对的第二大面上形成的孔口。 入射波通过的间隙位于注射器周围。