METROLOGY TECHNIQUE FOR SEMICONDUCTOR DEVICES

    公开(公告)号:US20240271926A1

    公开(公告)日:2024-08-15

    申请号:US18566919

    申请日:2022-06-03

    申请人: NOVA LTD.

    IPC分类号: G01B11/06

    CPC分类号: G01B11/06

    摘要: A method for semiconductor device metrology. The method may include creating a time-domain representation of wavelength-domain measurement data of light reflected by a three dimensional (3D) patterned structure of a semiconductor device; selecting one or more relevant peaks of the time-domain representation and at least one irrelevant portion of the time-domain representation. One or more relevant peaks occur during one or more relevant time periods; and are associated with corresponding relevant reference peaks that are associated with different versions of a reference 3D patterned structure.