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公开(公告)号:US20240361253A1
公开(公告)日:2024-10-31
申请号:US18595292
申请日:2024-03-04
Applicant: NOVA LTD.
Inventor: Gilad BARAK , DANNY GROSSMAN , Dror SHAFIR , YOAV BERLATZKY , Yanir HAINICK
IPC: G01N21/956 , G01B9/02001 , G01B9/02015 , G01B9/02055 , G01B9/0209 , G01B11/06 , G01J3/453 , G01N21/88
CPC classification number: G01N21/956 , G01B9/02007 , G01B9/02032 , G01B9/02072 , G01B9/0209 , G01B11/0675 , G01J3/4535 , G01N21/8806 , G01B2210/56 , G01B2290/70 , G01N2021/8848
Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.
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公开(公告)号:US20240337590A1
公开(公告)日:2024-10-10
申请号:US18426319
申请日:2024-01-29
Applicant: NOVA LTD.
Inventor: Dror SHAFIR , Gilad BARAK , Shay WOLFLING , Michal Haim YACHINI , Matthew SENDELBACH , Cornel BOZDOG
CPC classification number: G01N21/21 , G01N21/211 , G01N2021/4792 , G01N2201/061 , G01N2201/0683
Abstract: A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.
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公开(公告)号:US20240085805A1
公开(公告)日:2024-03-14
申请号:US18263305
申请日:2022-01-28
Applicant: NOVA LTD.
Inventor: Gilad BARAK , Amir Sagiv , Yishai Schreiber , Jacob Ofek , Zvi Gorohovsky , Daphna Peimer
IPC: G03F7/00 , G01N21/956
CPC classification number: G03F7/7065 , G01N21/95607 , G03F7/70625 , G03F7/706831 , G03F7/706833 , G03F7/706841 , H01L22/12
Abstract: A semiconductor device metrology including creating a time-domain representation of wavelength-domain measurement data of light reflected by a patterned structure of a semiconductor device, selecting a relevant and irrelevant portion of the time-domain representation, and determining one or more measurements of one or more parameters of interest of the patterned structure by performing model-based processing using the relevant portion of the time-domain representation.
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公开(公告)号:US20230296436A1
公开(公告)日:2023-09-21
申请号:US18003801
申请日:2021-07-05
Applicant: NOVA LTD.
Inventor: Yonatan OREN , Eyal Hollander , Elad Schleifer , Gilad BARAK
CPC classification number: G01J3/10 , G01J3/0208 , G01J3/0248 , G01J3/0291 , G01J3/18 , G01J3/2803 , G01J3/44
Abstract: Abstract: Systems and methods for metrology of workpieces such as wafers, using spectrometry of multi- spot- arrays formed over a test area of the tester workpiece, for optically measuring characteristics of the tested workpiece, where the optical metrology system is configured such that the distribution of energy density or flux of the multi-spot-array over the test area of the tested workpiece is such that prevents affecting the workpiece during its testing.
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公开(公告)号:US20240295436A1
公开(公告)日:2024-09-05
申请号:US18600698
申请日:2024-03-09
Applicant: NOVA LTD.
Inventor: Gilad BARAK , Yonatan OREN
CPC classification number: G01J3/0208 , G01J3/0224 , G01J3/06 , G01J3/10 , G01J3/2803 , G01J3/2823 , G01J3/44 , G01J2003/283
Abstract: A polarized Raman Spectrometric system for defining parameters of a polycrystalline material, the system comprises a polarized Raman Spectrometric apparatus, a computer-controlled sample stage for positioning a sample at different locations, and a computer comprising a processor and an associated memory. The polarized Raman Spectrometric apparatus generates signal(s) from either small sized spots at multiple locations on a sample or from an elongated line-shaped points on the sample, and the processor analyzes the signal(s) to define the parameters of said polycrystalline material.
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公开(公告)号:US20240085333A1
公开(公告)日:2024-03-14
申请号:US18452494
申请日:2023-08-18
Applicant: NOVA LTD.
Inventor: Elad Schleifer , Yonatan Oren , Amir Shayari , Eyal Hollander , Valery Deich , Shimon YALOV , Gilad BARAK
CPC classification number: G01N21/65 , G01J3/0205 , G01J3/027 , G01J3/4412 , G01N2201/06113 , G01N2201/0636
Abstract: A method, a system, and a non-transitory computer readable medium for accurate Raman spectroscopy. The method may include executing at least one iteration of the steps of: (i) performing, by an optical measurement system, a calibration process that comprises (a) finding a misalignment between a region of interest defined by a spatial filter, and an impinging beam of radiation that is emitted from an illuminated area of a sample, the impinging beam impinges on the spatial filter; and (b) determining a compensating path of propagation of the impinging beam that compensates the misalignment; and (ii) performing a measurement process, while the optical measurement system is configured to provide the compensating path of propagation of the impinging beam, to provide one or more Raman spectra.
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公开(公告)号:US20230130231A1
公开(公告)日:2023-04-27
申请号:US17935930
申请日:2022-09-27
Applicant: NOVA LTD.
Inventor: Gilad BARAK , Dror SHAFIR , Yanir HAINICK , Shahar Gov
IPC: G01N21/956 , G03F7/20 , G01N21/95
Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.
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公开(公告)号:US20240271926A1
公开(公告)日:2024-08-15
申请号:US18566919
申请日:2022-06-03
Applicant: NOVA LTD.
Inventor: Dror SHAFIR , Zvi Gorohovsky , Jacob Ofek , Daphna Peimer , Tal Heilpern , Dana Szafranek , Gilad BARAK , Smadar Ferber
IPC: G01B11/06
CPC classification number: G01B11/06
Abstract: A method for semiconductor device metrology. The method may include creating a time-domain representation of wavelength-domain measurement data of light reflected by a three dimensional (3D) patterned structure of a semiconductor device; selecting one or more relevant peaks of the time-domain representation and at least one irrelevant portion of the time-domain representation. One or more relevant peaks occur during one or more relevant time periods; and are associated with corresponding relevant reference peaks that are associated with different versions of a reference 3D patterned structure.
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公开(公告)号:US20230003637A1
公开(公告)日:2023-01-05
申请号:US17757224
申请日:2020-12-08
Applicant: NOVA LTD.
Inventor: Yonatan OREN , Gilad BARAK
Abstract: Photoreflectance (PR) spectroscopy system and method for accumulating separately a “pump on” light beam and a “pump off light beam reflecting off a sample. The system comprises: (a) a probe source for producing a probe beam, the probe beam is used for measuring spectral reflectivity of a sample, (b) a pump source for producing a pump beam, (c) at least one spectrometer, (d) a first modulation device to allow the pump beam to alternatingly modulate the spectral reflectivity of the sample, so that, a light beam reflecting from the sample is alternatingly a “pump on” light beam and a “pump off light beam, (e) a second modulation device in a path of the light beam reflecting off the sample to alternatingly direct the “pump on” light beam and the “pump off light beam to the at least one spectrometer, and (f) a computer.
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公开(公告)号:US20240210322A1
公开(公告)日:2024-06-27
申请号:US18402708
申请日:2024-01-02
Applicant: NOVA LTD.
Inventor: Eyal Hollander , Gilad BARAK , Elad Schleifer , Yonatan OREN , Amir Shayari
CPC classification number: G01N21/65 , G01J3/0205 , G01J3/027 , G01J3/4412 , G01N2201/06113 , G01N2201/0636
Abstract: A method, a system, and a non-transitory computer readable medium for Raman spectroscopy. The method may include determining first acquisition parameters of a Raman spectroscope to provide a first acquisition set-up, the determining is based on at least one expected radiation pattern to be detected by a sensor of the Raman spectroscope as a result of an illumination of a first area of a sample, the first area comprises a first nano-scale structure, wherein at least a part of the at least one expected radiation pattern is indicative of at least one property of interest of the first nano-scale structure of the sample; wherein the first acquisition parameters belong to a group of acquisition parameters; setting the Raman spectroscope according to the first acquisition set-up; and acquiring at least one first Raman spectrum of the first nano-scale structure of the sample, while being set according to the first acquisition set-up
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