Treatment of Silica Based Soot or an Article made of Silica Based Soot
    1.
    发明申请
    Treatment of Silica Based Soot or an Article made of Silica Based Soot 审中-公开
    二氧化硅烟炱或二氧化硅烟炱制品的处理

    公开(公告)号:US20120202674A1

    公开(公告)日:2012-08-09

    申请号:US13206004

    申请日:2011-08-09

    IPC分类号: C03C6/04

    摘要: One embodiment of the disclosure relates to a method of cleaning silica-based soot or an article made of silica-based soot, the method comprising the step of treating silica-based soot or the article made of silica-based soot with at least one of the following compounds: (i) a mixture of CO and Cl2 in a carrier gas such that the total concentration of CO and Cl2 in the mixture is greater than 10% (by volume, in carrier gas) and the ratio of CO:Cl2 is between 0.25 and 5; (ii) CCl4 in a carrier gas, such that concentration CCl4 is greater than 1% (by volume, in carrier gas). Preferably, the treatment by CCl4 is performed at temperatures between 600° C., and 850° C. Preferably, the treatment with the CO and Cl mixture is performed at temperatures between 900° C. and 1200° C. The carrier gas may be, for example, He, Ar, N2, or the combination thereof.

    摘要翻译: 本公开的一个实施方案涉及一种清洁二氧化硅基烟灰或由二氧化硅基烟灰制成的制品的方法,所述方法包括以下步骤:用二氧化硅基烟灰或由二氧化硅基烟灰制成的制品用至少一种 以下化合物:(i)载气中CO和Cl 2的混合物,使得混合物中CO和Cl2的总浓度大于载体气体中的10体积%(体积),CO:Cl 2的比例为 介于0.25和5之间; (ii)载气中的CCl 4,使得浓度CCl4大于1%(以体积计,在载气中)。 优选地,通过CCl 4的处理在600℃和850℃之间的温度下进行。优选地,用CO和Cl混合物的处理在900℃和1200℃之间的温度下进行。载气可以是 ,例如He,Ar,N2,或其组合。

    Treatment of silica based soot or an article made of silica based soot

    公开(公告)号:US10829403B2

    公开(公告)日:2020-11-10

    申请号:US13206004

    申请日:2011-08-09

    摘要: One embodiment of the disclosure relates to a method of cleaning silica-based soot or an article made of silica-based soot, the method comprising the step of treating silica-based soot or the article made of silica-based soot with at least one of the following compounds: (i) a mixture of CO and Cl2 in a carrier gas such that the total concentration of CO and Cl2 in the mixture is greater than 10% (by volume, in carrier gas) and the ratio of CO:Cl2 is between 0.25 and 5; (ii) CCl4 in a carrier gas, such that concentration CCl4 is greater than 1% (by volume, in carrier gas). Preferably, the treatment by CCl4 is performed at temperatures between 600° C., and 850° C. Preferably, the treatment with the CO and Cl mixture is performed at temperatures between 900° C. and 1200° C. The carrier gas may be, for example, He, Ar, N2, or the combination thereof.

    Fused silica having low OH, OD levels and method of making
    5.
    发明授权
    Fused silica having low OH, OD levels and method of making 有权
    熔融二氧化硅具有低OH,OD水平和制备方法

    公开(公告)号:US08062986B2

    公开(公告)日:2011-11-22

    申请号:US11881599

    申请日:2007-07-27

    IPC分类号: C03C3/06 C03B19/06 C03B19/00

    摘要: A fused silica article having a combined concentration of hydroxyl (OH) and deuteroxyl (OD) concentration of less than 10 parts per million (ppm) and, in one embodiment, less than 1 ppm. The fused silica article is formed by drying a soot blank in a halogen-free atmosphere comprising carbon monoxide. The dried soot blank may optionally be doped to reach target levels of OH and OD concentrations and improve homogeneity within the fused silica article. The dried soot blank is then oxidized and, sintered to form the article. A method of reducing the combined concentration of OH and OD to less than 10 ppm is also described.

    摘要翻译: 具有小于10ppm(ppm)的羟基(OH)和氘氧化(OD)浓度的组合浓度的熔融二氧化硅制品,在一个实施方案中小于1ppm。 熔融二氧化硅制品通过在包含一氧化碳的无卤素气氛中干燥烟炱坯料而形成。 干燥的烟炱坯料可以任选地被掺杂以达到OH和OD浓度的目标水平并且改善熔融二氧化硅制品内的均匀性。 然后将干燥的烟灰坯料氧化并烧结以形成制品。 还描述了将OH和OD的组合浓度降低至小于10ppm的方法。

    Apparatus and Method of Sintering an Optical Fiber Preform
    6.
    发明申请
    Apparatus and Method of Sintering an Optical Fiber Preform 审中-公开
    烧结光纤预制件的设备和方法

    公开(公告)号:US20100122558A1

    公开(公告)日:2010-05-20

    申请号:US12273958

    申请日:2008-11-19

    IPC分类号: C03B37/025

    CPC分类号: C03B37/0146 C03B37/01446

    摘要: A method and apparatus for consolidating an optical fiber preform, wherein the optical fiber preform is located in a furnace comprising a muffle tube, said muffle tube comprising an inner section and an outer section surrounding the inner section. The inner and outer sections are comprised of different materials, and the preform is exposed to a pressure less than 0.8 atm while simultaneously exposing said preform to a temperature of at least 1000 C.

    摘要翻译: 一种用于整合光纤预制件的方法和装置,其中光纤预制件位于包括马弗管的炉中,所述马弗管包括内部部分和围绕内部部分的外部部分。 内部和外部部分由不同的材料组成,并且预制件暴露于小于0.8atm的压力,同时将所述预制件暴露于至少1000℃的温度。

    Process for Preparing an Optical Preform
    7.
    发明申请
    Process for Preparing an Optical Preform 有权
    光学预制件的制备工艺

    公开(公告)号:US20090272716A1

    公开(公告)日:2009-11-05

    申请号:US12273642

    申请日:2008-11-19

    IPC分类号: B29D11/00

    摘要: A method of preparing an optical preform includes the steps of: a) etching an optical preform to remove a portion of an oxide material deposited on the preform by using a gas comprising an etchant gas containing fluorine at a sufficient temperature and gas concentration to create a redeposited germanium containing compounds contamination such as GeOx in the remaining oxide material; and b) cleaning the etched preform using a cleaning gas containing at least one halogen gas at a sufficient temperature and gas concentration to remove the redeposited germanium containing compound contamination without any substantial further contamination of the remaining deposited oxide material. Preferably the halogen is either chlorine or bromine.

    摘要翻译: 一种制备光学预成型件的方法包括以下步骤:a)通过使用在足够的温度和气体浓度下使用包含含氟蚀刻剂气体的气体来蚀刻光学预型件以去除沉积在预成型体上的氧化物材料的一部分,以产生 在剩余的氧化物材料中再沉积含锗化合物污染物如GeOx; 以及b)使用含有至少一种卤素气体的清洁气体在足够的温度和气体浓度下清洁蚀刻的预成型件,以除去再沉积的含锗化合物污染物,而不会进一步污染剩余的沉积的氧化物材料。 卤素优选为氯或溴。

    Soot radial pressing for optical fiber overcladding
    8.
    发明授权
    Soot radial pressing for optical fiber overcladding 有权
    用于光纤包覆的烟灰径向压制

    公开(公告)号:US08578736B2

    公开(公告)日:2013-11-12

    申请号:US12235931

    申请日:2008-09-23

    IPC分类号: C03B37/10

    CPC分类号: C03B37/01282

    摘要: A method and apparatus for making an optical fiber preform. The apparatus has an outer wall and an inner wall. The outer wall surrounds the inner wall and the inner wall surrounds an inner cavity of the apparatus. A consolidated glass rod is deposited in the inner cavity after which particulate glass material, such as glass soot, is deposited in the inner cavity around the glass rod. A radially inward pressure is applied against the particulate glass material to pressurize the particulate glass material against the glass rod.

    摘要翻译: 一种用于制造光纤预制棒的方法和装置。 该装置具有外壁和内壁。 外壁围绕内壁并且内壁围绕设备的内腔。 将固结的玻璃棒沉积在内腔中,之后将颗粒状玻璃材料(例如玻璃烟灰)沉积在玻璃棒周围的内腔中。 向颗粒状玻璃材料施加径向向内的压力以将颗粒状玻璃材料压靠玻璃棒。

    Fused silica having low OH, OD levels and method of making
    9.
    发明申请
    Fused silica having low OH, OD levels and method of making 有权
    熔融二氧化硅具有低OH,OD水平和制备方法

    公开(公告)号:US20090029842A1

    公开(公告)日:2009-01-29

    申请号:US11881599

    申请日:2007-07-27

    IPC分类号: C03C3/04 C03B19/00

    摘要: A fused silica article having a combined concentration of hydroxyl (OH) and deuteroxyl (OD) concentration of less than 10 parts per million (ppm) and, in one embodiment, less than 1 ppm. The fused silica article is formed by drying a soot blank in a halogen-free atmosphere comprising carbon monoxide. The dried soot blank may optionally be doped to reach target levels of OH and OD concentrations and improve homogeneity within the fused silica article. The dried soot blank is then oxidized and, sintered to form the article. A method of reducing the combined concentration of OH and OD to less than 10 ppm is also described.

    摘要翻译: 具有小于10ppm(ppm)的羟基(OH)和氘氧化(OD)浓度的组合浓度的熔融二氧化硅制品,在一个实施方案中小于1ppm。 熔融二氧化硅制品通过在包含一氧化碳的无卤素气氛中干燥烟炱坯料而形成。 干燥的烟炱坯料可以任选地被掺杂以达到OH和OD浓度的目标水平并且改善熔融二氧化硅制品内的均匀性。 然后将干燥的烟灰坯料氧化并烧结以形成制品。 还描述了将OH和OD的组合浓度降低至小于10ppm的方法。

    Process for preparing an optical preform
    10.
    发明授权
    Process for preparing an optical preform 有权
    光学预型件的制备方法

    公开(公告)号:US08815103B2

    公开(公告)日:2014-08-26

    申请号:US12273642

    申请日:2008-11-19

    IPC分类号: B29D11/00

    摘要: A method of preparing an optical preform includes the steps of: a) etching an optical preform to remove a portion of an oxide material deposited on the preform by using a gas comprising an etchant gas containing fluorine at a sufficient temperature and gas concentration to create a redeposited germanium containing compounds contamination such as GeOx in the remaining oxide material; and b) cleaning the etched preform using a cleaning gas containing at least one halogen gas at a sufficient temperature and gas concentration to remove the redeposited germanium containing compound contamination without any substantial further contamination of the remaining deposited oxide material. Preferably the halogen is either chlorine or bromine.

    摘要翻译: 一种制备光学预成型件的方法包括以下步骤:a)通过使用在足够的温度和气体浓度下使用包含含氟蚀刻剂气体的气体来蚀刻光学预型件以去除沉积在预成型体上的氧化物材料的一部分,以产生 在剩余的氧化物材料中再沉积含锗化合物污染物如GeOx; 以及b)使用含有至少一种卤素气体的清洁气体在足够的温度和气体浓度下清洁蚀刻的预成型件,以除去再沉积的含锗化合物污染物,而不会进一步污染剩余的沉积的氧化物材料。 卤素优选为氯或溴。