公开(公告)号：US09144984B2

公开(公告)日：2015-09-29

申请号：US14376058

申请日：2012-04-27

申请人： Ning Ge ,  Bee Ling Peh ,  Trudy Benjamin ,  Ken Kiat Ng ,  Jianhui Gu

发明人： Ning Ge ,  Bee Ling Peh ,  Trudy Benjamin ,  Ken Kiat Ng ,  Jianhui Gu

IPC分类号： B41J2/175 ,  B41J2/14 ,  B23K26/38 ,  B41J2/16

CPC分类号： B41J2/1433 ,  B23K26/384 ,  B41J2/14145 ,  B41J2/14201 ,  B41J2/162 ,  B41J2/1634 ,  B41J2/175 ,  B41J2002/14419 ,  Y10T29/49401 ,  Y10T29/49403

摘要： The present disclosure describes a compound slot, and systems and methods of forming the compound slot. An example of a compound slot includes a wafer, where the compound slot includes a trench along a long axis of the compound slot and on a top surface of the wafer, where the trench passes through an initial portion of a total depth of the wafer. A number of openings pass through a remaining portion of the total depth of the wafer, where at least a retained portion of a bottom of the trench is present around a perimeter of each of the number of openings.

摘要翻译： 本公开描述了复合槽，以及形成复合槽的系统和方法。 复合槽的示例包括晶片，其中复合槽包括沿着复合槽的长轴的沟槽和晶片的顶表面，其中沟槽穿过晶片的总深度的初始部分。 多个开口穿过晶片的总深度的剩余部分，其中至少沟槽底部的保留部分围绕每个开口的周边存在。

公开(公告)号：US20140362146A1

公开(公告)日：2014-12-11

申请号：US14376058

申请日：2012-04-27

申请人： Ning Ge ,  Bee Ling Peh ,  Trudy Benjamin ,  Ken Kiat Ng ,  Jianhui Gu

发明人： Ning Ge ,  Bee Ling Peh ,  Trudy Benjamin ,  Ken Kiat Ng ,  Jianhui Gu

IPC分类号： B41J2/175 ,  B23K26/38 ,  B41J2/16

CPC分类号： B41J2/1433 ,  B23K26/384 ,  B41J2/14145 ,  B41J2/14201 ,  B41J2/162 ,  B41J2/1634 ,  B41J2/175 ,  B41J2002/14419 ,  Y10T29/49401 ,  Y10T29/49403

摘要： The present disclosure describes a compound slot, and systems and methods of forming the compound slot. An example of a compound slot includes a wafer, where the compound slot includes a trench along a long axis of the compound slot and on a top surface of the wafer, where the trench passes through an initial portion of a total depth of the wafer. A number of openings pass through a remaining portion of the total depth of the wafer, where at least a retained portion of a bottom of the trench is present around a perimeter of each of the number of openings.

摘要翻译： 本公开描述了复合槽，以及形成复合槽的系统和方法。 复合槽的示例包括晶片，其中复合槽包括沿着复合槽的长轴的沟槽和晶片的顶表面，其中沟槽穿过晶片的总深度的初始部分。 多个开口穿过晶片的总深度的剩余部分，其中至少沟槽底部的保留部分围绕每个开口的周边存在。

公开(公告)号：US20070064060A1

公开(公告)日：2007-03-22

申请号：US11229825

申请日：2005-09-19

申请人： Jianhui Gu ,  Rio Rivas ,  Jeremy Donaldson ,  Bernard Rojas

发明人： Jianhui Gu ,  Rio Rivas ,  Jeremy Donaldson ,  Bernard Rojas

IPC分类号： B41J2/05

CPC分类号： B41J2/1404 ,  B41J2/14145 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1645 ,  B41J2002/14403

摘要： A method of forming an opening through a substrate includes defining an area on a first surface of the substrate where the opening is to be formed, the area having a center region flanked by edge regions. A top layer having a substantially closed space located over the area is formed on the first surface. Structure for promoting etching of the center region is provided, and the first surface of the substrate is etched in the area. In one embodiment, the method can fabricate an inkjet printhead having a substrate having an ink feed hole formed therethrough and an orifice plate formed thereon. A plurality of particle tolerance elements located over a center region of the ink feed hole promoted etching during the fabrication of the printhead.

摘要翻译： 通过基板形成开口的方法包括限定在要形成开口的基板的第一表面上的区域，该区域具有侧面为边缘区域的中心区域。 在所述第一表面上形成有位于所述区域上方的基本封闭空间的顶层。 提供了用于促进中心区域的蚀刻的结构，并且在该区域中蚀刻基板的第一表面。 在一个实施例中，该方法可以制造具有基底的喷墨打印头，该基底具有形成在其上的供墨孔和形成在其上的孔板。 位于墨水供给孔的中心区域之上的多个颗粒公差元件在打印头的制造过程中促进蚀刻。

公开(公告)号：US08043517B2

公开(公告)日：2011-10-25

申请号：US11229825

申请日：2005-09-19

申请人： Jianhui Gu ,  Rio Rivas ,  Jeremy Harlan Donaldson ,  Bernard A Rojas

发明人： Jianhui Gu ,  Rio Rivas ,  Jeremy Harlan Donaldson ,  Bernard A Rojas

IPC分类号： B41J2/16

CPC分类号： B41J2/1404 ,  B41J2/14145 ,  B41J2/1603 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1634 ,  B41J2/1645 ,  B41J2002/14403

摘要： A method of forming an opening through a substrate includes defining an area on a first surface of the substrate where the opening is to be formed, the area having a center region flanked by edge regions. A top layer having a substantially closed space located over the area is formed on the first surface. Structure for promoting etching of the center region is provided, and the first surface of the substrate is etched in the area. In one embodiment, the method can fabricate an inkjet printhead having a substrate having an ink feed hole formed therethrough and an orifice plate formed thereon. A plurality of particle tolerance elements located over a center region of the ink feed hole promoted etching during the fabrication of the printhead.

摘要翻译： 通过基板形成开口的方法包括限定在要形成开口的基板的第一表面上的区域，该区域具有侧面为边缘区域的中心区域。 在所述第一表面上形成有位于所述区域上方的基本封闭空间的顶层。 提供了用于促进中心区域的蚀刻的结构，并且在该区域中蚀刻基板的第一表面。 在一个实施例中，该方法可以制造具有基底的喷墨打印头，该基底具有形成在其上的供墨孔和形成在其上的孔板。 位于墨水供给孔的中心区域之上的多个颗粒公差元件在打印头的制造过程中促进蚀刻。

公开(公告)号：US20060032841A1

公开(公告)日：2006-02-16

申请号：US10915510

申请日：2004-08-10

申请人： Kee Tan ,  Ping Zhan ,  Jiansan Sun ,  Jianhui Gu

发明人： Kee Tan ,  Ping Zhan ,  Jiansan Sun ,  Jianhui Gu

IPC分类号： B23K26/38 ,  B23K26/14

CPC分类号： B41J2/1634 ,  B23K26/0624 ,  B23K26/389 ,  B41J2/16

摘要： The present invention provides a method of forming a feature in a printhead component. Femtosecond laser beam pulses are scanned over a target zone of a printhead substrate to remove a layer of the printhead substrate. The scanning is repeated until a depth of printhead substrate has been removed from the target zone which corresponds to a desired feature depth. The removed portion of the printhead substrate forms at least part of the feature in the printhead component.

摘要翻译： 本发明提供一种在打印头部件中形成特征的方法。 在打印头基板的目标区域上扫描飞秒激光束脉冲以去除打印头基底的一层。 重复扫描直到打印头基底的深度已经从对应于期望的特征深度的目标区域去除。 打印头基板的去除部分形成打印头部件中的特征的至少一部分。