公开(公告)号：US5118953A

公开(公告)日：1992-06-02

申请号：US528244

申请日：1990-05-24

申请人： Kazuya Ota ,  Nobutaka Magome ,  Hideo Mizutani ,  Kouichiro Komatsu

发明人： Kazuya Ota ,  Nobutaka Magome ,  Hideo Mizutani ,  Kouichiro Komatsu

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7065 ,  G03F9/7049

摘要： An alignment apparatus is provided with a first beam receiving device arranged to receive an interference beam which is produced at a diffraction grating of a substrate as a result of illumination with a pair of beams which intersect each other on the substrate, and a second beam receiving device arranged to receive a reference beam which is produced by the interference between regularly reflected beams of the pair of beams occurring on the substrate, wherein the positional offset of the substrate is obtained on the basis of a comparison between the output signal of the first beam receiving device and the output signal of the second beam receiving device. Since a beam transmitting path for transmitting a measurement beam is substantially common to a beam transmitting path for a reference beam, even if the fluctuations of air occur, both the measurement beam and the reference beam substantially equally reflect the influence of the fluctuations, whereby it is possible to cancel the same.

摘要翻译： 对准装置设置有第一光束接收装置，该第一光束接收装置被布置成接收在基板的衍射光栅处产生的干涉光束，所述干涉光束是由于在基板上彼此相交的一对光束照明的结果而产生的，并且第二光束接收 该设备被布置为接收由基板上出现的一对光束的规则反射光束之间的干涉产生的参考光束，其中基于第一光束的输出信号之间的比较获得基板的位置偏移 接收装置和第二光束接收装置的输出信号。 由于用于发送测量光束的光束传输路径对于参考光束的光束传输路径基本上是共同的，所以即使发生空气的波动，测量光束和参考光束都基本上等同地反映了波动的影响，由此 有可能取消相同的。

公开(公告)号：US5347356A

公开(公告)日：1994-09-13

申请号：US982129

申请日：1992-11-25

申请人： Kazuya Ota ,  Nobutaka Magome ,  Hideo Mizutani ,  Kouichiro Komatsu

发明人： Kazuya Ota ,  Nobutaka Magome ,  Hideo Mizutani ,  Kouichiro Komatsu

IPC分类号： G01B11/00 ,  G01B9/02 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7049 ,  G01B9/02002 ,  G01B9/02003 ,  G01B9/02097 ,  G03F7/70633 ,  G03F7/70691 ,  G01B2290/30 ,  G01B2290/60 ,  G01B2290/70

摘要： An aligning device for aligning a substrate with a predetermined point on the basis of a detection signal from a photoelectric detector uses interference light generated by light diffracted from a diffraction grating. A calculating device calculates at least one of a crossing angle of two coherent beams irradiating the grating and the rotational error of a crossing line between a plane containing principal rays of the beams and the surface of the substrate, with respect to the direction of arrangement of the grating, based on the phase difference between detection signals of the photoelectric detector corresponding to interference light generated from different portions of the crossing area. The output of the calculating device may be used to adjust the crossing angle and/or to correct the rotational error.

摘要翻译： 基于来自光电检测器的检测信号将基板与预定点对准的对准装置使用由衍射光栅衍射的光产生的干涉光。 计算装置计算照射光栅的两个相干光束的交叉角度与包含光束的主光线和基板表面的平面之间的交叉线的旋转误差中的至少一个相对于 基于光电检测器的检测信号之间的相位差对应于由交叉区域的不同部分产生的干涉光的光栅。 可以使用计算装置的输出来调整交叉角度和/或校正旋转误差。

公开(公告)号：US5489986A

公开(公告)日：1996-02-06

申请号：US233081

申请日：1994-04-25

申请人： Nobutaka Magome ,  Kazuya Ota ,  Hideo Mizutani ,  Kouichiro Komatsu

发明人： Nobutaka Magome ,  Kazuya Ota ,  Hideo Mizutani ,  Kouichiro Komatsu

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F9/70

摘要： In a position detecting apparatus having an object optical system, two beams are generated for irradiating a diffraction grating formed on an object from two directions at a predetermined intersect angle for forming an interference fringe, the beams passing through a pupil plane of the object optical system spaced apart a predetermined distance from each other. An opto-electric detector receives diffracted light from the grating via the object optical system and outputs a detection signal, and the position of the object is determined on the basis of the detection signal. An adjustable optical member provided in a light path between an optical source and the object changes incident angles at which the two beams are incident on the grating while keeping the intersect angle between the two beams substantially constant.

摘要翻译： 在具有物体光学系统的位置检测装置中，产生两个光束，用于以形成干涉条纹的预定相交角从两个方向照射形成在物体上的衍射光栅，通过物镜光学系统的光瞳面 彼此隔开预定的距离。 光电检测器经由对象光学系统从光栅接收衍射光并输出检测信号，并且基于检测信号确定物体的位置。 设置在光源和物体之间的光路中的可调节光学构件改变两个光束入射到光栅上的入射角，同时保持两个光束之间的相交角基本上恒定。

公开(公告)号：US5151750A

公开(公告)日：1992-09-29

申请号：US505504

申请日：1990-04-06

申请人： Nobutaka Magome ,  Kazuya Ota ,  Hideo Mizutani ,  Kouichiro Komatsu

发明人： Nobutaka Magome ,  Kazuya Ota ,  Hideo Mizutani ,  Kouichiro Komatsu

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7049 ,  G03F7/70725 ,  G03F9/7076

摘要： There is disclosed an apparatus for transferring a reticle pattern onto a wafer, in which the reticle and the wafer are mutually aligned by irradiating an alignment mark of the wafer with light beams and detecting the optical information from the mark. Depending on the shape of the wafer mark, suitably selected is a first light beam passing through the center of entrance pupil of an objective optical system, or a pair of second light beams passing through the entrance pupil point-symmetrically with respect to its center. The wafer mark consists of a main mark and an auxiliary mark, and the main mark contains a diffraction grating pattern. The second paired light beams and the main mark are used for determining the positional error within an integral fraction of the pitch of the diffraction grating pattern, and the first light beam and the auxiliary mark are used for determining the positional error of an integral multiple of the pitch of the diffraction grating pattern.

摘要翻译： 公开了一种用于将掩模版图案转印到晶片上的装置，其中通过用光束照射晶片的对准标记并且从标记检测光学信息来将标线片和晶片相互对准。 根据晶片标记的形状，适当地选择通过物镜光学系统的入射光瞳的中心的第一光束或相对于其中心点对称地通过入射光瞳的一对第二光束。 晶片标记由主标记和辅助标记组成，主标记包含衍射光栅图案。 第二配对光束和主标记用于确定衍射光栅图案的间距的整数分数内的位置误差，并且第一光束和辅助标记用于确定衍射光栅图案的整数倍的位置误差 衍射光栅图案的间距。

公开(公告)号：US5568257A

公开(公告)日：1996-10-22

申请号：US441062

申请日：1995-05-15

申请人： Kazuya Ota ,  Hideo Mizutani ,  Kouichiro Komatsu

发明人： Kazuya Ota ,  Hideo Mizutani ,  Kouichiro Komatsu

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B9/02 ,  G01B11/00

CPC分类号： G03F9/70

摘要： The structure of an alignment apparatus is as follows: The illuminating areas of the two laser beams for the use of alignment, which are irradiated onto a diffraction grating on a substrate and a diffraction grating mark on a fiducial member, are relatively driven by a field diaphragm and a diaphragm member. A photoelectric detector receives the interference light generated from a first portion in the area on the above-mentioned diffraction mark where the two laser beams intersect following the above-mentioned relative driving, and receives the interference light generated from a second portion in the aforesaid area. A main control system calculates the intersecting angles or rotational error of the two laser beams on the basis of the phase difference of the detection signals from the aforesaid photoelectric detector. The intersecting angles or rotational error is corrected by allowing the parallel flat glasses, which are arranged on the light path, to be slanted.

摘要翻译： 对准装置的结构如下：照射到基板上的衍射光栅上的两个用于对准的激光束的照明区域和基准部件上的衍射光栅标记相对地被场地驱动 隔膜和隔膜构件。 光电检测器接收由上述相关驱动之后两个激光束相交的上述衍射标记上的区域中的第一部分产生的干涉光，并接收由上述区域中的第二部分产生的干涉光 。 主控制系统根据来自上述光电检测器的检测信号的相位差来计算两个激光束的相交角或旋转误差。 通过使布置在光路上的平行平板眼镜倾斜来校正交叉角度或旋转误差。

公开(公告)号：US5572325A

公开(公告)日：1996-11-05

申请号：US467677

申请日：1995-06-06

申请人： Kouichiro Komatsu ,  Masashi Tanaka

发明人： Kouichiro Komatsu ,  Masashi Tanaka

IPC分类号： G01B11/00 ,  G03F9/00

CPC分类号： G03F9/70

摘要： A position detecting apparatus for optically observing an opaque mark formed on a transparent substrate to detect a position of the mark with a high degree of accuracy. The apparatus includes a detection optical system for forming a detected image of the mark, an illumination system for supplying an illuminating light to the mark through an objective lens of the detection optical system, projection means arranged to face the detection optical system through the substrate and forming a conjugate position to the mark, and reflecting means which is settable substantially at the conjugate position. The image of the mark can be detected as either a bright image or a dark image under the conditions where there are a sufficient contrast between the mark and the background and a uniform background density. The shape of the mark and the arrangement of patterns around the mark can be determined as desired.

摘要翻译： 一种位置检测装置，用于光学地观察形成在透明基板上的不透明标记，以高精度检测标记的位置。 该装置包括用于形成标记的检测图像的检测光学系统，用于通过检测光学系统的物镜向标记提供照明光的照明系统，被布置成通过基板面对检测光学系统的投影装置，以及 形成标记的共轭位置，以及基本上在共轭位置可调整的反射装置。 在标记和背景之间具有足够的对比度和均匀的背景密度的条件下，标记的图像可以被检测为亮图像或暗图像。 可以根据需要确定标记的形状和标记周围的图案的排列。

公开(公告)号：US5483348A

公开(公告)日：1996-01-09

申请号：US344613

申请日：1994-11-18

申请人： Kouichiro Komatsu ,  Masashi Tanaka

发明人： Kouichiro Komatsu ,  Masashi Tanaka

IPC分类号： G01B11/00 ,  G03F9/00

CPC分类号： G03F9/70

摘要： A position detecting apparatus for optically observing an opaque mark formed on a transparent substrate to detect a position of the mark with a high degree of accuracy. The apparatus includes a detection optical system for forming a detected image of the mark, an illumination system for supplying an illuminating light to the mark through an objective lens of the detection optical system, projection means arranged to face the detection optical system through the substrate and forming a conjugate position to the mark, and reflecting means which is settable substantially at the conjugate position. The image of the mark can be detected as either a bright image or a dark image under the conditions where there are a sufficient contrast between the mark and the background and a uniform background density. The shape of the mark and the arrangement of patterns around the mark can be determined as desired.

摘要翻译： 一种位置检测装置，用于光学地观察形成在透明基板上的不透明标记，以高精度检测标记的位置。 该装置包括用于形成标记的检测图像的检测光学系统，用于通过检测光学系统的物镜向标记提供照明光的照明系统，被布置成通过基板面对检测光学系统的投影装置，以及 形成标记的共轭位置，以及基本上在共轭位置可调整的反射装置。 在标记和背景之间具有足够的对比度和均匀的背景密度的条件下，标记的图像可以被检测为亮图像或暗图像。 可以根据需要确定标记的形状和标记周围的图案的排列。