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公开(公告)号：US09851634B2
公开(公告)日：2017-12-26
申请号：US14372938
申请日：2013-01-25
CPC分类号： G03F7/0002 , B29C59/002 , B29C59/16 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F9/7003 , G03F9/7042 , G03F9/7065
摘要： An imprint apparatus forms a pattern of a resin on a region to be processed of a substrate using a mold including a pattern region on which a pattern is formed and includes a correction unit configured to correct a shape of a target region that is either the pattern region on the mold or the region to be processed on the substrate, wherein the correction unit further includes: a heating unit configured to heat an object corresponding to the target region of either the mold or the substrate in a heating region having an area smaller than that of the pattern region on the mold; a scanning unit configured to scan the heating region with respect to the target region by changing the relative position of the target region and the heating region; and a control unit configured to acquire information regarding a correction deformation amount of the target region and control the heating unit and the scanning unit based on the information.
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2.发明申请APPARATUS AND METHOD FOR DETECTING POSITION, EXPOSURE APPARATUS, AND METHOD FOR THE SAME 审中-公开用于检测位置的装置和方法，曝光装置及其相关方法公开(公告)号：US20170060003A1
公开(公告)日：2017-03-02
申请号：US15242230
申请日：2016-08-19
发明人： Tadaki Miyazaki
CPC分类号： H05B37/0227 , G01B11/14 , G03F9/7065
摘要： A position detecting apparatus that detects a position of an object by detecting a mark on the object includes a light receiving element, a control unit, a light source, and an adjusting unit. The light receiving element receives light from the mark and accumulates the light as signals. The control unit detects a position of the mark based on the light from the mark. The light source illuminates the mark. The adjusting unit adjusts an amount of light applied to the mark. The control unit determines the amount of the light from the mark based on the accumulated signals in parallel with a term during which the accumulated signals are transferred to the control unit. The control unit adjusts the amount of light applied to the mark based on the amount of the light from the mark or detects the position of the mark based on the light from the mark.
摘要翻译： 通过检测物体上的标记来检测物体的位置的位置检测装置包括光接收元件，控制单元，光源和调节单元。 光接收元件接收来自标记的光并将光累积为信号。 控制单元基于来自标记的光来检测标记的位置。 光源照亮标记。 调整单元调节施加到标记的光量。 控制单元根据积累的信号与积累的信号被传送到控制单元的项并行地确定来自标记的光量。 控制单元基于来自标记的光的量来调整施加到标记的光量，或者基于来自标记的光来检测标记的位置。
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3.发明申请公开(公告)号：US20150185623A1
公开(公告)日：2015-07-02
申请号：US14580028
申请日：2014-12-22
发明人： Wataru Yamaguchi , Hideki Ina
IPC分类号： G03F7/20
CPC分类号： G03F7/70616 , G03F7/70575 , G03F9/7065
摘要： An optical device provided with an optical system illuminating light on a target surface, including: three light sources configured to emit light beams of different wavelengths; a first fiber configured to guide, to the optical system, two light beams among the three light beams from the three light sources; and a second fiber configured to guide, to the optical system, the light beam of a wavelength other than the two light beams. A cutoff wavelength of the first fiber differs from a cutoff wavelength of the second fiber.
摘要翻译： 一种设置有在目标表面上照射光的光学系统的光学装置，包括：三个光源，被配置为发射不同波长的光束; 第一光纤，被配置为将来自所述三个光源的三个光束中的两个光束引导到所述光学系统; 以及第二光纤，被配置为向所述光学系统引导除了所述两个光束之外的波长的光束。 第一光纤的截止波长与第二光纤的截止波长不同。
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公开(公告)号：US20150014892A1
公开(公告)日：2015-01-15
申请号：US14326662
申请日：2014-07-09
发明人： Ken-ichiro SHINODA
CPC分类号： G03F9/7065 , G03F7/0002 , G03F9/7038 , G03F9/7069 , G03F9/7088
摘要： The present invention provides an imprint apparatus which forms a pattern on an imprint material on a substrate by using a mold, including a first optical member interposed between an illumination optical system and a detection optical system, and a mold, and configured to guide a first light from the illumination optical system and a second light from the detection optical system to the mold, and a second optical member interposed between the first optical member and the detection optical system, and configured to transmit the second light which is reflected by a mark formed on the mold or a mark formed on the substrate and travels toward the detection optical system through the first optical member, and block the first light which travels toward the detection optical system through the first optical member.
摘要翻译： 本发明提供一种压印装置，其通过使用包括插入在照明光学系统和检测光学系统之间的第一光学构件的模具和模具在基板上的压印材料上形成图案，并且被配置为引导第一 来自照明光学系统的光和从检测光学系统到模具的第二光，以及插入在第一光学构件和检测光学系统之间的第二光学构件，并且被配置为透射由形成的标记反射的第二光 在模具上或形成在基板上的标记，并通过第一光学部件朝向检测光学系统行进，并且通过第一光学部件阻挡朝向检测光学系统行进的第一光。
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5.发明授权Level sensor arrangement for lithographic apparatus and device manufacturing method 有权用于光刻设备和装置制造方法的液位传感器装置公开(公告)号：US08842293B2
公开(公告)日：2014-09-23
申请号：US12722955
申请日：2010-03-12
CPC分类号： G03F9/7034 , G03F9/7065 , G03F9/7088
摘要： A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
摘要翻译： 液位传感器装置可用于测量光刻设备中的基板表面的高度。 液位传感器装置设置有朝向基板发射检测辐射的光源，以及用于在操作中测量从基板反射的辐射的检测器单元。 光源布置成在光刻设备中用于处理基板的抗蚀剂敏感的波长范围内发射检测辐射。
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公开(公告)号：US20140253891A1
公开(公告)日：2014-09-11
申请号：US14281346
申请日：2014-05-19
发明人： Arie Jeffrey DEN BOEF , Earl William EBERT, JR. , Harry SEWELL , Keith William ANDRESEN , Sanjeev Kumar SINGH
CPC分类号： G03F7/70141 , G01B11/14 , G02F1/116 , G03F7/70191 , G03F9/7065
摘要： A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into narrow-band linearly polarized radiation. The tunable narrow pass-band filter is further configured to modulate an intensity and wavelength of the narrow-band radiation and to provide a plurality of pass-band filters at a same time or nearly the same time. The alignment system further includes a relay and mechanical interface configured to receive the narrow-band radiation and to adjust a profile of the narrow-band radiation based on physical properties of alignment targets on a substrate. The adjusted narrow-band radiation is focused on the alignment targets using a focusing system.
摘要翻译： 光刻设备包括对准系统，其包括被配置为接收宽带辐射并将宽带辐射过滤成窄带线偏振辐射的可调谐窄带通滤波器。 可调谐窄带通滤波器还被配置为调制窄带辐射的强度和波长并且在同时或几乎同时提供多个通带滤波器。 对准系统还包括被配置为接收窄带辐射并基于衬底上的对准靶的物理特性来调整窄带辐射的轮廓的继电器和机械接口。 使用聚焦系统将经调整的窄带辐射聚焦在对准目标上。
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公开(公告)号：US08781213B2
公开(公告)日：2014-07-15
申请号：US13302308
申请日：2011-11-22
CPC分类号： G03F9/7084 , G03F9/7065 , G03F9/7076 , G03F9/708 , G03F9/7088 , H01L33/22
摘要： An alignment system for aligning a wafer when lithographically fabricating LEDs having an LED wavelength λLED is disclosed. The system includes the wafer. The wafer has a roughened alignment mark with a root-mean-square (RMS) surface roughness σS. The system has a lens configured to superimpose an image of the reticle alignment mark with an image of the roughened alignment mark. The roughened alignment marked image is formed with alignment light having a wavelength λA that is in the range from about 2σS to about 8σS. An image sensor detects the superimposed image. An image processing unit processes the detected superimposed image to measure an alignment offset between the wafer and the reticle.
摘要翻译： 公开了一种用于在光刻制造具有LED波长λLED的LED的晶片时对准晶片的对准系统。 该系统包括晶片。 晶片具有粗糙的对准标记，均方根（RMS）表面粗糙度S。 该系统具有配置为用掩模版对准标记的图像叠加掩模版对准标记的图像的透镜。 粗糙的对准标记图像由波长λA为约2＆Sgr; S至约8＆Sgr; S的对准光形成。 图像传感器检测叠加图像。 图像处理单元处理检测到的叠加图像以测量晶片和标线片之间的对准偏移。
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公开(公告)号：US08760619B2
公开(公告)日：2014-06-24
申请号：US12962903
申请日：2010-12-08
申请人： Hiroyuki Koide
发明人： Hiroyuki Koide
CPC分类号： G03F9/7088 , G03F9/7065
摘要： An exposure apparatus includes an original stage including a first mark, a substrate stage including a second mark and a photoelectric conversion device configured to detect light having passed through the second mark, a projection optical system, a measurement device configured to measure a position of at least one stage of the substrate stage and the original stage, and a controller configured to detect a positional relationship between the first mark and the second mark based on a signal output from the photoelectric conversion device and a measurement result output from the measurement device, wherein the controller cyclically samples a measurement result output from the measurement device, corrects the measurement result based on a time interval between a light emission timing of the pulsed light source and a sampling timing of the measurement result.
摘要翻译： 曝光装置包括：包括第一标记的原始台，包括第二标记的基板台和被配置为检测通过第二标记的光的光电转换装置;投影光学系统;被配置为测量位置的测量装置 基板台和原始台的至少一个阶段，以及控制器，被配置为基于从光电转换装置输出的信号和从测量装置输出的测量结果来检测第一标记和第二标记之间的位置关系，其中 控制器循环地采样从测量装置输出的测量结果，基于脉冲光源的发光定时与测量结果的采样定时之间的时间间隔来校正测量结果。
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公开(公告)号：US20130258316A1
公开(公告)日：2013-10-03
申请号：US13898973
申请日：2013-05-21
申请人： ASML Holding N.V.
发明人： Arie Jeffrey DEN BOEF , Earl William EBERT , Harry SEWELL , Keith William ANDRESEN , Sanjeev Kumar SINGH
CPC分类号： G03F7/70141 , G01B11/14 , G02F1/116 , G03F7/70191 , G03F9/7065
摘要： A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.
摘要翻译： 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。
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10.发明授权Surface position detecting apparatus, exposure apparatus and device manufacturing method 有权表面位置检测装置，曝光装置及装置的制造方法公开(公告)号：US08432554B2
公开(公告)日：2013-04-30
申请号：US12093713
申请日：2006-11-14
申请人： Yasuhiro Hidaka
发明人： Yasuhiro Hidaka
IPC分类号： G01B11/14
CPC分类号： G03F9/7065 , G01B11/14 , G03F9/7026 , G03F9/7034 , G03F9/7088
摘要： A surface position detecting apparatus is arranged to be able to detect a surface position of a detection target surface with high accuracy, while restraining influence of a relative positional deviation between polarization components in a beam totally reflected on an internal reflection surface of a prism member, on detection of the surface position of the detection target surface. At least one of a light projection system and a light reception system is provided with a total reflection prism member (7; 8) having an internal reflection surface (7b, 7c; 8b, 8c) which totally reflects an incident beam. For restraining influence of the relative positional deviation between polarization components of the beam totally reflected on the internal reflection surface of the total reflection prism member, on the detection of the surface position of the detection target surface (Wa), a refractive index of an optical material forming the total reflection prism member and an angle of incidence of the incident beam to the internal reflection surface of the total reflection prism member are set so as to satisfy a predetermined relation.
摘要翻译： 表面位置检测装置被布置成能够高精度地检测检测目标表面的表面位置，同时抑制全反射在棱镜构件的内反射面上的光束中的偏振分量之间的相对位置偏差的影响， 检测目标表面的表面位置。 光投射系统和光接收系统中的至少一个设置有具有全反射入射光束的内反射面（7b，7c; 8b，8c）的全反射棱镜部件（7; 8）。 为了抑制在全反射棱镜部件的内反射面上全反射的光束的偏振分量之间的相对位置偏移的影响，在检测目标表面（Wa）的表面位置的检测时，光学 形成全反射棱镜构件的材料和入射光束到全反射棱镜构件的内反射面的入射角被设定为满足预定关系。
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