公开(公告)号：US20160064610A1

公开(公告)日：2016-03-03

申请号：US14888681

申请日：2014-04-24

Applicant: OSRAM OPTO SEMICONDUCTORS GMBH

Inventor： Markus BROLL ,  Christoph KLEMP ,  Wolfgang SCHMID

IPC: H01L33/38 ,  H01L33/42 ,  H01L33/62

CPC classification number: H01L33/38 ,  H01L33/10 ,  H01L33/36 ,  H01L33/405 ,  H01L33/42 ,  H01L33/46 ,  H01L33/62 ,  H01L2933/0016 ,  H01L2933/0066

Abstract: A method for producing an optoelectronic component is disclosed. A first layer which has a dielectric to the surface of a semiconductor crystal. A photoresist layer is applied and structured on the first layer. The photoresist layer is structured in such a way that the photoresist layer has an opening, The first layer is partially separated in order to expose a lateral region of the surface. A contact area having a first metal is applied in the lateral region of the surface. The photoresist layer is removed. A second layer, which comprises an optically transparent, electrically conductive material, and a third layer, which comprises a second metal, are applied.

Abstract translation: 公开了一种用于制造光电子部件的方法。 对于半导体晶体的表面具有电介质的第一层。 在第一层上施加并构造光刻胶层。 光致抗蚀剂层被构造成使得光致抗蚀剂层具有开口。第一层被部分分离以暴露表面的横向区域。 具有第一金属的接触区域被施加在表面的横向区域中。 去除光致抗蚀剂层。 包括光学透明的导电材料的第二层和包括第二金属的第三层被施加。