公开(公告)号：US12013642B2

公开(公告)日：2024-06-18

申请号：US17991084

申请日：2022-11-21

Applicant: PHOTRONICS, INC.

Inventor： Bryan S. Kasprowicz ,  Christopher Progler

IPC: G03F7/20 ,  G03F1/38 ,  G03F1/62 ,  G03F1/64

CPC classification number: G03F7/2002 ,  G03F1/38 ,  G03F1/62 ,  G03F1/64

Abstract: A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.

公开(公告)号：US11119403B2

公开(公告)日：2021-09-14

申请号：US16568365

申请日：2019-09-12

Applicant: PHOTRONICS, INC.

Inventor： Bryan S. Kasprowicz ,  Christopher Progler

IPC: G03F1/64 ,  G03F1/38 ,  G03F1/62

Abstract: A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.

公开(公告)号：US20230161259A1

公开(公告)日：2023-05-25

申请号：US17991084

申请日：2022-11-21

Applicant: PHOTRONICS, INC.

Inventor： Bryan S. Kasprowicz ,  Christopher Progler

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/38 ,  G03F1/62

CPC classification number: G03F7/2002 ,  G03F1/64 ,  G03F1/38 ,  G03F1/62

Abstract: A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.

公开(公告)号：US20210389664A1

公开(公告)日：2021-12-16

申请号：US17444927

申请日：2021-08-12

Applicant: PHOTRONICS, INC.

Inventor： Bryan S. Kasprowicz ,  Christopher Progler

IPC: G03F1/64 ,  G03F1/38 ,  G03F1/62

Abstract: A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.

公开(公告)号：US20240280908A1

公开(公告)日：2024-08-22

申请号：US18649060

申请日：2024-04-29

Applicant: PHOTRONICS, INC.

Inventor： Bryan S. Kasprowicz ,  Christopher Progler

IPC: G03F7/20 ,  G03F1/38 ,  G03F1/62 ,  G03F1/64

CPC classification number: G03F7/2002 ,  G03F1/38 ,  G03F1/62 ,  G03F1/64

Abstract: A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.

公开(公告)号：US11537050B2

公开(公告)日：2022-12-27

申请号：US17444927

申请日：2021-08-12

Applicant: PHOTRONICS, INC.

Inventor： Bryan S. Kasprowicz ,  Christopher Progler

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/38 ,  G03F1/62

Abstract: A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.

公开(公告)号：US20200081337A1

公开(公告)日：2020-03-12

申请号：US16568365

申请日：2019-09-12

Applicant: PHOTRONICS, INC.

Inventor： Bryan S. Kasprowicz ,  Christopher Progler

IPC: G03F1/64 ,  G03F1/38 ,  G03F1/26

Abstract: A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.