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公开(公告)号：US11948824B2
公开(公告)日：2024-04-02
申请号：US18144471
申请日：2023-05-08
Applicant: PHOTRONICS, INC.
IPC: G03F1/64 , G03F7/00 , H01L21/68 , H01L21/687 , B32B38/10 , G03F1/62 , G03F1/82 , H01L21/683
CPC classification number: H01L21/68 , H01L21/682 , H01L21/68742 , B32B38/10 , G03F1/62 , G03F1/64 , G03F1/82 , G03F7/70983 , H01L21/683 , Y10T156/1168
Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.
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公开(公告)号：US20210341832A1
公开(公告)日：2021-11-04
申请号：US17245113
申请日：2021-04-30
Applicant: Photronics, Inc.
Inventor： Mohamed Ramadan , Michael Green , Young Ham , Christopher J. Progler
Abstract: Methods and systems for building a photomask from obtained pattern information relating to a photomask that exhibits defects on wafer. Spatial domain analysis is conducted on the pattern information so that corrective photomask structures can be generated and applied to a photomask layout. A photomask is built using the corrective photomask structures. The photomask is verified for effectiveness.
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公开(公告)号：US20140272688A1
公开(公告)日：2014-09-18
申请号：US13837299
申请日：2013-03-15
Applicant: PHOTRONICS, INC.
Inventor： Brian W. DILLION
IPC: G03F7/20
CPC classification number: G03F7/0043 , G03F1/50 , Y02E50/17
Abstract: A method for forming a three-dimensional microstructure includes providing a photosensitive glass substrate; exposing the photosensitive glass substrate to energy through a continuous tone, variable transmission photomask so as to form opaque portions in the photosensitive glass substrate, each of the opaque portions having one of a variety of depths extending through the entire thickness of the photosensitive glass substrate; and removing the opaque portions so as to form three-dimensional features in the photosensitive glass substrate.
Abstract translation: 形成三维微结构的方法包括提供感光性玻璃基板; 将光敏玻璃基板通过连续色调可变透射光掩模曝光，以在感光玻璃基板中形成不透明部分，每个不透明部分具有延伸穿过感光玻璃基板整个厚度的各种深度之一; 并且去除不透明部分以便在感光玻璃基板中形成三维特征。
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公开(公告)号：US20140204450A1
公开(公告)日：2014-07-24
申请号：US14160142
申请日：2014-01-21
Applicant: PHOTRONICS, INC.
Inventor： Christopher J. Progler
CPC classification number: G02B26/004 , E06B3/6722 , F24S10/502 , F24S50/80 , F24S70/14 , F28D20/0034 , G01N27/44704 , G01N27/44782 , G02F1/0147 , G02F1/13338 , G02F1/29 , G02F2201/30 , G02F2203/62 , G06F3/041 , G06F3/0412 , H01L35/30 , Y02E10/44 , Y02E60/142 , Y10T137/2213 , Y10T137/2224
Abstract: A microfluidic panel including at least one substrate, one or more channels formed in the substrate, and fluid disposed within the one or more channels. The fluid is selected to store thermal energy and the microfluidic panel is adapted to convert the thermal energy into useable energy or condition the energy to adjust optical wavelength passband of the panel.
Abstract translation: 一种微流体面板，包括至少一个衬底，在衬底中形成的一个或多个通道，以及设置在一个或多个通道内的流体。 选择流体以存储热能，并且微流体面板适于将热能转换成可用能量或调节能量以调节面板的光学波长通带。
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公开(公告)号：US12013642B2
公开(公告)日：2024-06-18
申请号：US17991084
申请日：2022-11-21
Applicant: PHOTRONICS, INC.
Inventor： Bryan S. Kasprowicz , Christopher Progler
CPC classification number: G03F7/2002 , G03F1/38 , G03F1/62 , G03F1/64
Abstract: A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.
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Patent Agency Ranking
公开(公告)号：US20230305385A1
公开(公告)日：2023-09-28
申请号：US18123428
申请日：2023-03-20
Applicant: PHOTRONICS, INC.
Inventor： Christopher Progler , Young Mog Ham
IPC: G03F1/72
CPC classification number: G03F1/72
Abstract: A method of manufacturing a photomask including the steps of providing a photomask blank, inspecting the photomask blank to determine presence of one or more defects in the photomask blank, wherein the one or more defects comprise one or more photomask substrate defects, and compensating for the one or more photomask substrate defects by roughening one or more surface portions of the photomask substrate.
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公开(公告)号：US11119403B2
公开(公告)日：2021-09-14
申请号：US16568365
申请日：2019-09-12
Applicant: PHOTRONICS, INC.
Inventor： Bryan S. Kasprowicz , Christopher Progler
Abstract: A pellicle assembly for large-size photomasks including a frame member configured to be affixed to a large-size photomask substrate, a substantially rigid and transparent pellicle membrane affixed to the frame member so as to protect at least a portion of the large-size photomask substrate from contamination during usage, storage and/or transport, and a coating on at least one of top and bottom surfaces of the pellicle membrane that binds the pellicle membrane to prevent separation of pellicle membrane material in the event of breakage.
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公开(公告)号：US20160209639A1
公开(公告)日：2016-07-21
申请号：US15085828
申请日：2016-03-30
Applicant: PHOTRONICS, INC.
Inventor： Christopher J. Progler
CPC classification number: G02B26/004 , E06B3/6722 , F24S10/502 , F24S50/80 , F24S70/14 , F28D20/0034 , G01N27/44704 , G01N27/44782 , G02F1/0147 , G02F1/13338 , G02F1/29 , G02F2201/30 , G02F2203/62 , G06F3/041 , G06F3/0412 , H01L35/30 , Y02E10/44 , Y02E60/142 , Y10T137/2213 , Y10T137/2224
Abstract: A microfluidic panel including at least one substrate, one or more channels formed in the substrate, and fluid disposed within the one or more channels. The fluid is selected to store thermal energy and the microfluidic panel is adapted to convert the thermal energy into useable energy or condition the energy to adjust optical wavelength passband of the panel.
Abstract translation: 一种微流体面板，包括至少一个衬底，在衬底中形成的一个或多个通道，以及设置在一个或多个通道内的流体。 选择流体以存储热能，并且微流体面板适于将热能转换成可用能量或调节能量以调节面板的光学波长通带。
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公开(公告)号：US20030128929A1
公开(公告)日：2003-07-10
申请号：US10369262
申请日：2003-02-19
Applicant: Photronics, Inc.
Inventor： James Owen Unruh
IPC: G02B006/34
CPC classification number: G02B6/02085 , G02B6/02138 , G03F1/34 , G03F7/0005
Abstract: A chirped Bragg grating is fabricated in an optical fiber by exposing the fiber to a coherent beam of light through a parallel phase mask having a series of progressively chirped segments produced on a lithography tool. The chirped phase mask is fabricated by exposing a photoresist-coated substrate to an image writing element such as an electron beam or a laser according to a set of parameters provided to the lithography tool. The parameters include a basic grating pattern for each segment, a value that defines the expansion or contraction of the grating pattern and an axis location to which the grating pattern is to be written to the substrate. By selecting machine commands that implement these parameters with a minimum throughput overhead, the mask can be produced in a reduced time, and therefore with increased accuracy.
Abstract translation: 通过在光刻工具上产生的具有一系列逐渐啁啾线段的平行相位掩模将光纤暴露于相干光束，在光纤中制造啁啾布拉格光栅。 通过根据提供给光刻工具的一组参数将光致抗蚀剂涂覆的基板暴露于诸如电子束或激光器的图像写入元件来制造啁啾相位掩模。 参数包括每个段的基本光栅图案，限定光栅图案的扩展或收缩的值以及将光栅图案写入基板的轴位置。 通过选择以最小吞吐量开销来实现这些参数的机器命令，可以在减少的时间内产生掩模，因此可以提高精度。
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公开(公告)号：US20240242996A1
公开(公告)日：2024-07-18
申请号：US18423816
申请日：2024-01-26
Applicant: PHOTRONICS, INC.
IPC: H01L21/68 , H01L21/687 , B32B38/10 , G03F1/62 , G03F1/64 , G03F1/82 , G03F7/00 , H01L21/683
CPC classification number: H01L21/68 , H01L21/682 , H01L21/68742 , B32B38/10 , G03F1/62 , G03F1/64 , G03F1/82 , G03F7/70983 , H01L21/683 , Y10T156/1168
Abstract: A pellicle removal tool including a stage that holds a photomask and an associated pellicle, two or more arms positioned around the stage and configured to engage pellicle side wells of the pellicle, and two or more actuators each configured to adjust at least a vertical position of a corresponding one of the two or more arms so as to apply a lifting force to the pellicle for removal of the pellicle from the photomask.
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