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公开(公告)号：US20210260618A1
公开(公告)日：2021-08-26
申请号：US17318264
申请日：2021-05-12
发明人： Juan Alberto Galindo Gonzalez , Richard Yorde , Rick Anderson , Jess A. McGilvery , Washington I. McGilvery , Douglas Michael , Randy D. Kummer
摘要： A process of applying a fluid containing one or more additives to a surface of a linear substrate in a linear compartment. The process includes passing the linear substrate through first and second seals of the linear compartment, contacting the linear substrate with the fluid within a chamber within the linear compartment while an exposure gap has a first length that is greater than zero, the contacting being conducted for a time with the fluid at a temperature. The linear compartment is dimensionally reconfigurable, optionally during an infusion process.
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公开(公告)号：US09718080B1
公开(公告)日：2017-08-01
申请号：US15179089
申请日：2016-06-10
发明人： Juan Alberto Galindo Gonzalez , Richard Yorde , Rick Anderson , Jess A. McGilvery , Washington I. McGilvery , Douglas Michael , Randy D. Kummer
IPC分类号： B05C3/15 , B05C11/115 , B05D1/18 , B05D7/02 , B21C3/14 , H01B13/32 , B29C47/08 , B29C47/12 , B29C47/22 , B21C3/06 , B21C9/00 , B29C47/02 , B29C70/50
CPC分类号： B05C3/15 , B21C3/06 , B21C3/14 , B21C9/00 , B29C47/025 , B29C47/0866 , B29C47/124 , B29C47/22 , B29C47/28 , B29C70/50 , H01B13/323 , H01B13/326 , H01B13/327 , H01B13/328 , Y10S118/11 , Y10S118/18 , Y10S118/19
摘要： Provided are apparatuses for the infusion of one or more additives into the surface of a linear substrate. The apparatuses include a processing barrel having an infusion chamber defined therein as well as a linear substrate inlet and a linear substrate outlet. The processing barrel also includes an infusion fluid inlet and an infusion solution outlet in fluid communication with the infusion chamber. The infusion chamber is dimensionally reconfigurable, optionally during an infusion process.
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公开(公告)号：US11033923B2
公开(公告)日：2021-06-15
申请号：US16099067
申请日：2017-05-08
发明人： Juan Alberto Galindo Gonzalez , Richard Yorde , Rick Anderson , Jess A. McGilvery , Washington I. McGilvery , Douglas Michael , Randy D. Kummer
IPC分类号： B05C3/15 , H01B13/32 , B21C3/06 , B29C48/154 , B05D7/20 , B05D1/18 , H01B13/16 , B21C3/14 , B21C9/00 , B29C70/50 , B29C48/25 , B29C48/30 , B29C48/325 , B29C48/06 , B29C48/34
摘要： Provided are apparatuses for the processing of one or more components of a fluid into the surface of a linear substrate. The apparatuses include a processing barrel having a chamber defined therein as well as a linear substrate inlet and a linear substrate outlet. The processing barrel also includes a fluid inlet and a fluid outlet in fluid communication with the chamber. An exposure gap is defined between the linear substrate inlet and the linear substrate outlet. The chamber is dimensionally reconfigurable so that the exposure gap can have a length from zero to greater than zero.
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