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公开(公告)号:US20240149289A1
公开(公告)日:2024-05-09
申请号:US18187098
申请日:2023-03-21
Applicant: SEMES CO., LTD.
Inventor: Bu Young JUNG , Ju Hwan LEE , Hyun Woo BAE
CPC classification number: B05B13/0278 , B05B14/10 , B05B14/30 , B05C9/06 , B05D1/34
Abstract: A substrate processing apparatus includes a first supply pipe supplying a first chemical liquid to a substrate, a second supply pipe, spaced apart from the first supply pipe, and supplying a second chemical liquid to the substrate, and a recovery pipe connected to the first supply pipe to collect the first chemical liquid, and disposed between the first supply pipe and the second supply pipe.
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公开(公告)号:US20250105049A1
公开(公告)日:2025-03-27
申请号:US18896026
申请日:2024-09-25
Applicant: Semes Co., Ltd
Inventor: Seung Eun NA , Dae Hun KIM , Hyun Woo BAE , Seong Hyeon KIM
IPC: H01L21/687 , H01L21/67
Abstract: Disclosed is a substrate processing apparatus including: a processing container having a processing space therein; a support unit for supporting and rotating a substrate within the processing space; and a nozzle unit for supplying a treatment solution to the substrate, in which the processing container includes a plurality of cups that encloses the processing space and is provided so that openings through which the treatment solution is introduced are stacked in an up and down direction, and each of the plurality of cups includes: a sidewall; and an upper wall extending from the sidewall toward the processing space, and an inner end of an upper wall of a first cup, of which the upper wall is located at the uppermost side among the plurality of cups, protrudes further toward the processing space than an inner end of an upper wall of another cup.
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