公开(公告)号：US20210074557A1

公开(公告)日：2021-03-11

申请号：US16952629

申请日：2020-11-19

Applicant: SEMES CO., LTD.

Inventor： Jintack YU ,  Jaemyoung LEE

IPC: H01L21/67 ,  H01L21/02 ,  B08B3/02

Abstract: Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.

公开(公告)号：US20170338132A1

公开(公告)日：2017-11-23

申请号：US15671848

申请日：2017-08-08

Applicant: SEMES CO., LTD.

Inventor： Jintack YU ,  Jaemyoung LEE

IPC: H01L21/67

CPC classification number: H01L21/67051

Abstract: Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head.