公开(公告)号：US20230201863A1

公开(公告)日：2023-06-29

申请号：US18146740

申请日：2022-12-27

Applicant: SEMES CO., LTD.

Inventor： Eunwoo PARK ,  Jongwha KANG ,  Wooram LEE ,  Sung-Gyu LEE ,  Dongwoon PARK ,  Yongdae CHO ,  Donghoon KANG ,  Kisang EUM

IPC: B05C5/02

CPC classification number: B05C5/0275 ,  B05C5/0208

Abstract: Provided is an apparatus for processing a substrate. The substrate processing apparatus includes: a processing unit processing a substrate; and a gas supply unit supplying gas to the processing unit, in which the gas supply unit includes a first housing having a first internal space which is in fluid communication with a processing space of the processing unit, a second housing disposed in the first internal space, and having a second internal space which is in fluid communication with the first internal space, and a gas supply duct supplying the gas to the second internal space.