公开(公告)号：US20230201863A1

公开(公告)日：2023-06-29

申请号：US18146740

申请日：2022-12-27

Applicant: SEMES CO., LTD.

Inventor： Eunwoo PARK ,  Jongwha KANG ,  Wooram LEE ,  Sung-Gyu LEE ,  Dongwoon PARK ,  Yongdae CHO ,  Donghoon KANG ,  Kisang EUM

IPC: B05C5/02

CPC classification number: B05C5/0275 ,  B05C5/0208

Abstract: Provided is an apparatus for processing a substrate. The substrate processing apparatus includes: a processing unit processing a substrate; and a gas supply unit supplying gas to the processing unit, in which the gas supply unit includes a first housing having a first internal space which is in fluid communication with a processing space of the processing unit, a second housing disposed in the first internal space, and having a second internal space which is in fluid communication with the first internal space, and a gas supply duct supplying the gas to the second internal space.

公开(公告)号：US20230131562A1

公开(公告)日：2023-04-27

申请号：US17969171

申请日：2022-10-19

Applicant: SEMES CO., LTD.

Inventor： Dae Woon LEE ,  Young Ju JO ,  Sung-Gyu LEE

IPC: H01L21/67 ,  H01L21/687

Abstract: Provided is an apparatus for treating a substrate, the apparatus including: a liquid treating chamber for liquid-treating a substrate by supplying a treatment liquid to the substrate; and a liquid supply unit for supplying the treatment liquid to the liquid treating chamber, in which the liquid supply unit includes: a cabinet configured to be mounted with a bottle containing the treatment liquid; and a rotation generating part configured to rotate the bottle so that a direction in which an inlet of the bottle mounted on the cabinet faces is changed.

公开(公告)号：US20230051256A1

公开(公告)日：2023-02-16

申请号：US17885865

申请日：2022-08-11

Applicant: SEMES CO., LTD.

Inventor： Sung-Gyu LEE ,  Jung-Hyun LEE ,  Hye Bin BAEK ,  Dae Woon LEE ,  Dongwoon PARK

IPC: G03F7/16

Abstract: Disclosed is an apparatus for treating a substrate, which includes: a first unit configured to perform a coating process of forming a film on a substrate; a transfer unit including a transfer robot transferring a substrate for which the coating process is terminated; and a controller controlling the first unit and the transfer unit, in which the controller controls the substrate for which the coating process is terminated in the first unit to rotate at a first rotational velocity until the substrate is transferred by the transfer unit.