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公开(公告)号:US10749002B2
公开(公告)日:2020-08-18
申请号:US16680846
申请日:2019-11-12
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Martin Domeij
IPC: H01L29/16 , H01L29/66 , H01L29/78 , H01L29/08 , H01L21/308 , H01L29/10 , H01L27/092
Abstract: A semiconductor device includes a source region configured to provide at least a portion of a MOSFET source of a MOSFET and at least a portion of a JFET source of a JFET. The semiconductor device includes a JFET channel region in series with the source region and a MOSFET channel region of the MOSFET, and disposed between a first JFET gate and a second JFET gate. The semiconductor device includes a JFET drain disposed at least partially between a gate insulator of a gate of the MOSFET and at least a portion of the JFET channel region, and in electrical contact with the first JFET gate and the second JFET gate. Various example implementations of this type of semiconductor device provide a SiC power MOSFET with improved short-circuit capability and durability, with minimal impact on RDS-ON.
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公开(公告)号:US11817478B2
公开(公告)日:2023-11-14
申请号:US17247796
申请日:2020-12-23
Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Inventor: Jaume Roig-Guitart , Fredrik Allerstam , Thomas Neyer , Andrei Konstantinov , Martin Domeij , Jangkwon Lim
CPC classification number: H01L29/0623 , H01L29/1608
Abstract: In a general aspect, a semiconductor device can include a substrate of a first conductivity type, an active region disposed in the substrate, and a termination region disposed in the substrate adjacent to the active region. The termination region can include a junction termination extension (JTE) of a second conductivity type, where the second conductivity type is opposite the first conductivity type. The JTE can have a first depletion stopper region disposed in an upper portion of the JTE, a second depletion stopper region disposed in a lower portion of the JTE, and a high carrier mobility region disposed between the first depletion stopper region and the second depletion stopper region.
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