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公开(公告)号：US10048521B2
公开(公告)日：2018-08-14
申请号：US14777127
申请日：2014-01-17
发明人： Xiaocheng Liu , Wen-Pin Chiang
IPC分类号： A46B9/00 , B08B1/00 , B08B5/00 , B08B5/02 , B08B7/00 , B08B7/02 , B08B15/00 , G02F1/13 , G02F1/1337
摘要： The present invention discloses a liquid crystal photo-alignment device. The liquid crystal photo-alignment device includes two parallel guide rails, a platform sandwiched between the two guide rails, a support assembly slidably mounted on the two guide rails, and a cleaning assembly mounted to the support assembly. The platform has a supporting surface for supporting a LCD panel. Each support assembly includes a supporting beam across the platform, two supporting arms extending from opposite ends of the supporting beam, and two sliders connected to the respective supporting arms. The sliders are slidably mounted in the guide rails. The cleaning assembly faces toward the platform and is configured to clean up foreign objects on the platform.
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公开(公告)号：US20140286735A1
公开(公告)日：2014-09-25
申请号：US14112943
申请日：2013-06-25
发明人： Xiaocheng Liu
CPC分类号： B66F7/00 , B25B11/005 , G02F1/1303 , G02F1/133788 , G02F2001/133715
摘要： A lift mechanism for a glass substrate in an exposure machine is provided, which comprises a base, a lift platform mounted on the top of the base and used to lift the glass substrate, lift bars mounted on the perimeter of the base, and at least one adsorbing devices mounted above the glass substrate; the lift bars are used to lift the perimeter of the glass substrate; each of the adsorbing devices is used to adsorb the upper surface of the substrate and able to move along the vertical direction and the horizontal direction. The lift mechanism for the glass substrate comprises a lift platform, and it has good integrality and uniform temperature, which is benefit for the HVA optically aligning of the glass substrate. Furthermore, the switch between the two-part lift method and the three-part lift method will be simple and with high working efficiency.
摘要翻译： 提供了一种用于曝光机中的玻璃基板的提升机构，其包括基座，安装在基座顶部上并用于提升玻璃基板的提升平台，安装在基座周边上的提升杆，至少 一个吸附装置安装在玻璃基板上方; 提升杆用于提升玻璃基板的周边; 吸附装置中的每一个用于吸附基板的上表面并且能够沿垂直方向和水平方向移动。 玻璃基板的提升机构包括升降平台，具有良好的整体性和均匀的温度，有利于玻璃基板的HVA光学对准。 此外，两部分提升方法和三部分提升方法之间的切换将简单，工作效率高。
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公开(公告)号：US09352943B2
公开(公告)日：2016-05-31
申请号：US14112943
申请日：2013-06-25
发明人： Xiaocheng Liu
IPC分类号： B25B11/00 , B66F7/00 , G02F1/13 , G02F1/1337
CPC分类号： B66F7/00 , B25B11/005 , G02F1/1303 , G02F1/133788 , G02F2001/133715
摘要： A lift mechanism for a glass substrate in an exposure machine is provided, which comprises a base, a lift platform mounted on the top of the base and used to lift the glass substrate, lift bars mounted on the perimeter of the base, and at least one adsorbing devices mounted above the glass substrate; the lift bars are used to lift the perimeter of the glass substrate; each of the adsorbing devices is used to adsorb the upper surface of the substrate and able to move along the vertical direction and the horizontal direction.
摘要翻译： 提供了一种用于曝光机中的玻璃基板的提升机构，其包括基座，安装在基座顶部上并用于提升玻璃基板的提升平台，安装在基座周边上的提升杆，至少 一个吸附装置安装在玻璃基板上方; 提升杆用于提升玻璃基板的周边; 吸附装置中的每一个用于吸附基板的上表面并且能够沿垂直方向和水平方向移动。
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公开(公告)号：US09281092B2
公开(公告)日：2016-03-08
申请号：US14235362
申请日：2013-12-24
发明人： Xiaocheng Liu
IPC分类号： G21K5/00 , G21K1/06 , G21K5/02 , G02F1/1337
CPC分类号： G21K1/067 , G02F1/1303 , G02F1/133711 , G02F1/133788 , G02F2001/133715 , G21K5/02
摘要： The present invention provides an ultraviolet light oven for aligning liquid crystal molecules, comprising a plurality of ultraviolet light sources, each of the reflectors including a reflecting surface facing to the ultraviolet light source, wherein the reflector includes a first optical portion in the form of recess defined on the refracting surface. The present invention further provides an ultraviolet light oven for aligning liquid crystal molecules, and by providing a first optical portion on a reflecting surface of the reflector, and a second optical portion on the side surface of the reflector to as to properly reflect the light beam with is not directly projected toward the substrate and therefore increase the utilization of the ultraviolet light, the exposure and homogeneousness of the ultraviolet light. As a result, the exposing period is shortened, the working efficiency is increased.
摘要翻译： 本发明提供了一种用于对准液晶分子的紫外光烘箱，其包括多个紫外光源，每个反射器包括面向紫外光源的反射表面，其中反射器包括凹陷形式的第一光学部分 定义在折射表面上。 本发明还提供了一种用于对准液晶分子的紫外光烘箱，并且通过在反射器的反射表面上设置第一光学部分和在反射器的侧表面上的第二光学部分，以便适当地反射光束 不会直接投射到基板上，因此增加紫外光的利用率，紫外线的曝光和均匀性。 结果，曝光期间缩短，工作效率提高。
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