MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING AND REPRODUCING APPARATUS
    2.
    发明申请
    MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING AND REPRODUCING APPARATUS 审中-公开
    磁记录介质,磁记录和再现设备

    公开(公告)号:US20160240219A1

    公开(公告)日:2016-08-18

    申请号:US15044529

    申请日:2016-02-16

    CPC classification number: G11B5/725 G11B5/72 G11B5/82

    Abstract: A magnetic recording medium which is capable of effectively preventing a surface thereof from being contaminated, and is capable of preventing a contaminant thereon from adhering (being transferred) to a magnetic head, and a magnetic recording and reproducing apparatus including the magnetic recording medium are provided,A carbon protective layer of the magnetic recording medium is nitrided, and as a lubricant a compound A expressed by the following General Formula (1) and a compound B expressed by the following General Formula (2) are mixed and used. R1—C6H4OCH2CH(OH)CH2OCH2—R2—CH2OCH2CH(OH)CH2OH  (1) CH2(OH)CH(OH)CH2OCH2CF2CF2(OCF2CF2CF2)mOCF2CF2CH2OCH2CH(OH)CH2OH  (2)

    Abstract translation: 能够有效地防止其表面被污染并能够防止其上的污染物粘附(转印)到磁头的磁记录介质,并且提供包括磁记录介质的磁记录和再现装置 将磁记录介质的碳保护层氮化,作为润滑剂混合使用由以下通式(1)表示的化合物A和由以下通式(2)表示的化合物B. (OH)CH 2 OH(2)R 1 -C 6 H 4 OCH 3 CH(OH)CH 2 OCH 2 -CH 2 OH(1)CH 2(OH)CH(OH)CH 2 OCH 2 CF 2 CF 2(OCF 2 CF 2 CF 2)

    MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING AND REPRODUCING APPARATUS
    3.
    发明申请
    MAGNETIC RECORDING MEDIUM AND MAGNETIC RECORDING AND REPRODUCING APPARATUS 审中-公开
    磁记录介质和磁记录和再现装置

    公开(公告)号:US20170011765A1

    公开(公告)日:2017-01-12

    申请号:US15202674

    申请日:2016-07-06

    CPC classification number: G11B5/725 G11B5/72

    Abstract: A magnetic recording medium 11 in which the outermost surface of a protective layer 3 on a lubricant layer 4 side contains carbon and nitrogen of 10 atomic % to 90 atomic %, the lubricant layer 4 is formed by being in contact with the outermost surface, and contains a compound A of Formula (1) and a compound B of Formula (2), a mass ratio (A/B) of the compound A with respect to the compound B is 0.2 to 0.3, the average molecular weights of the compounds A and B are 1,500 to 2,000 and 1,300 to 2,400, respectively, and the average film thickness is 0.5 nm to 2 nm. R1-C6H4OCH2CH(OH)CH2OCH2—R2-CH2OCH2CH(OH)CH2OH   (1) (R1 is an alkoxy group having 1 to 4 carbon atoms. R2 is —CF2O(CF2CF2O)x(CF2O)yCF2—.) HOCH2CF2CF2O(CF2CF2CF2O)mCF2CF2CH2OCH2CH(OH)CH2OH   (2)

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