公开(公告)号：US20160148633A1

公开(公告)日：2016-05-26

申请号：US14935529

申请日：2015-11-09

Applicant: SHOWA DENKO K.K. ,  JAPAN ATOMIC ENERGY AGENCY

Inventor： Kota HASEGAWA ,  Takahiro UKAI ,  Eishin YAMAKAWA ,  Shiro ENTANI ,  Seiji SAKAI

IPC: G11B5/73 ,  G11B5/72 ,  G11B5/127

CPC classification number: G11B5/72 ,  G11B5/66 ,  G11B5/82

Abstract: A perpendicular magnetic recording medium includes a perpendicular magnetic layer provided above a nonmagnetic substrate, and a protection layer provided on the perpendicular magnetic layer. The perpendicular magnetic layer has an hcp structure, and includes stacked layers having a (0002) crystal plane oriented parallel to a surface of the nonmagnetic substrate. An uppermost layer amongst the stacked layers includes polycrystal grains selected from a CoCr-base alloy, a CoPt-base alloy, a CoCrPt-base alloy, and a CoPtCr-base alloy. The protection layer makes contact with the uppermost layer of the perpendicular magnetic layer, and includes a single graphene layer or a graphene stack, and an amorphous carbon layer. The single graphene layer or the graphene stack is bonded in parallel to a (0002) crystal plane of the polycrystal grains.

Abstract translation: 垂直磁记录介质包括设置在非磁性衬底上的垂直磁性层和设置在垂直磁性层上的保护层。 垂直磁性层具有hcp结构，并且包括具有平行于非磁性基底的表面取向的（0002）晶面的堆叠层。 堆叠层中的最上层包括选自CoCr基合金，CoPt基合金，CoCrPt基合金和CoPtCr基合金的多晶粒。 保护层与垂直磁性层的最上层接触，并且包括单个石墨烯层或石墨烯叠层和无定形碳层。 单个石墨烯层或石墨烯层与多晶粒的（0002）晶面平行地结合。

公开(公告)号：US20170084305A1

公开(公告)日：2017-03-23

申请号：US15264988

申请日：2016-09-14

Applicant: SHOWA DENKO K.K.

Inventor： Eishin YAMAKAWA ,  Katsuaki TO ,  Saeko HAYASE

IPC: G11B19/28 ,  G11B5/73 ,  G11B21/10

CPC classification number: G11B19/28 ,  G11B5/72 ,  G11B5/725 ,  G11B21/106

Abstract: In a magnetic recording medium of the present invention, an outermost surface of a protective layer 3 on a lubricant layer 4 side contains carbon and nitrogen in a range of 50 atomic % to 90 atomic %, and the lubricant layer 4 is formed by being in contact with the outermost surface, contains compounds A to C represented in the below general formulas (1) to (3) described below, and has a film thickness of 0.5 nm to 2 nm. R1-C6H4OCH2CH(OH)CH2OCH2—R2-CH2OCH2CH(OH)CH2OH   (1), CH2(OH)CH(OH)CH2OCH2CF2CF2(OCF2CF2CF2)mOCF2CF2CH2OCH2CH(OH)CH2OH   (2), HOCH2CF2CF2O(CF2CF2CF2O)sCF2CF2CH2OCH2CH(OH)CH2OH   (3)

公开(公告)号：US20180257105A1

公开(公告)日：2018-09-13

申请号：US15895114

申请日：2018-02-13

Applicant: SHOWA DENKO K.K. ,  A SCHOOL CORPORATION KANSAI UNIVERSITY

Inventor： Hiroshi TANI ,  Hiroshi SAKAI ,  Eishin YAMAKAWA ,  Kazuki SHINDO

IPC: B05D1/00

CPC classification number: B05D1/60 ,  B29C33/3842 ,  B29C33/62 ,  C23C16/48 ,  C23C16/482 ,  C23C16/503 ,  G03F7/0002 ,  G11B5/84

Abstract: A film production method for producing a thin film on a surface of a workpiece, including the steps of: disposing the workpiece in a chamber; supplying a process gas into the chamber with the inside of the chamber being maintained at a predetermined pressure; applying a light having an energy between 3 eV and 10 eV to the surface of the workpiece to cause a photoelectron to be emitted from the surface of the workpiece; and applying an AC electric field to the surface of the workpiece, wherein the AC electric field has an electric field intensity causing a Townsend discharge to occur without generating a glow discharge plasma.

公开(公告)号：US20160240219A1

公开(公告)日：2016-08-18

申请号：US15044529

申请日：2016-02-16

Applicant: SHOWA DENKO K.K.

Inventor： Yoshihiko MARUYAMA ,  Selvaraj AANANDHA ,  Yuan Ai KHOO ,  Satoru NAKAMURA ,  Hiromitsu TANUMA ,  Eishin YAMAKAWA

IPC: G11B5/725 ,  G11B5/64 ,  G11B5/09

CPC classification number: G11B5/725 ,  G11B5/72 ,  G11B5/82

Abstract: A magnetic recording medium which is capable of effectively preventing a surface thereof from being contaminated, and is capable of preventing a contaminant thereon from adhering (being transferred) to a magnetic head, and a magnetic recording and reproducing apparatus including the magnetic recording medium are provided,A carbon protective layer of the magnetic recording medium is nitrided, and as a lubricant a compound A expressed by the following General Formula (1) and a compound B expressed by the following General Formula (2) are mixed and used. R1—C6H4OCH2CH(OH)CH2OCH2—R2—CH2OCH2CH(OH)CH2OH  (1) CH2(OH)CH(OH)CH2OCH2CF2CF2(OCF2CF2CF2)mOCF2CF2CH2OCH2CH(OH)CH2OH  (2)

Abstract translation: 能够有效地防止其表面被污染并能够防止其上的污染物粘附（转印）到磁头的磁记录介质，并且提供包括磁记录介质的磁记录和再现装置 将磁记录介质的碳保护层氮化，作为润滑剂混合使用由以下通式（1）表示的化合物A和由以下通式（2）表示的化合物B. （OH）CH 2 OH（2）R 1 -C 6 H 4 OCH 3 CH（OH）CH 2 OCH 2 -CH 2 OH（1）CH 2（OH）CH（OH）CH 2 OCH 2 CF 2 CF 2（OCF 2 CF 2 CF 2）