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公开(公告)号:US12072416B2
公开(公告)日:2024-08-27
申请号:US17258394
申请日:2019-07-04
发明人: Tomoharu Ogita
IPC分类号: G01S17/08 , G01B11/22 , G01S7/481 , G01S17/89 , H01L27/146
CPC分类号: G01S17/08 , G01B11/22 , G01S7/4816 , G01S17/89 , H01L27/14623 , H01L27/14627 , H01L27/14629 , H01L27/1463 , H01L27/14636 , H01L27/14649
摘要: The present technology relates to a light-receiving element and a distance-measuring module. A light-receiving element includes an on-chip lens, a wiring layer, and a semiconductor layer arranged between the on-chip lens and the wiring layer, the semiconductor layer includes a first voltage application portion to which a first voltage is applied, a second voltage application portion to which a second voltage different from the first voltage is applied, a first charge detection portion arranged around the first voltage application portion, a second charge detection portion arranged around the second voltage application portion, and a pixel separation portion that separates the semiconductor layer at least up to a predetermined depth in a boundary portion of adjacent pixels, and a third voltage is applied to the pixel separation portion. The present technology can be applied to, for example, a light-receiving element that generates distance information by a ToF method.
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公开(公告)号:US11715751B2
公开(公告)日:2023-08-01
申请号:US17316047
申请日:2021-05-10
发明人: Hidenobu Tsugawa , Tomoharu Ogita
IPC分类号: H01L27/146 , A61B1/05 , B60R11/04 , B60R16/023 , G05D1/02 , H04N25/79
CPC分类号: H01L27/14634 , A61B1/051 , H01L27/14636 , B60R11/04 , B60R16/0231 , G05D1/021 , H04N25/79
摘要: The present technology relates a solid-state imaging element, an electronic apparatus, and a semiconductor device each of which enables deterioration of electrical characteristics in a well region of a semiconductor element formed in a thinned semiconductor substrate to be restrained. A solid-state imaging element as a first aspect of the present technology is a solid-state imaging element constituted by laminating semiconductor substrates in three or more layers, in which of the laminated semiconductor substrates, at least one sheet of the semiconductor substrate is thinned, and an impurity region whose carrier type is the same as that of the thinned semiconductor substrate is formed between a well region and a thinned surface portion in the thinned semiconductor substrate. The present technology can, for example, be applied to a CMOS image sensor.
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公开(公告)号:US11362126B2
公开(公告)日:2022-06-14
申请号:US16638928
申请日:2019-07-04
发明人: Tomoharu Ogita
IPC分类号: H01L27/146 , G01S17/08
摘要: The present technology relates to a light reception device and a distance measurement module. The light reception device includes an on-chip lens, a wiring layer, and a semiconductor layer between the on-chip lens and the wiring layer. The semiconductor layer includes a first voltage application portion to which a first voltage is applied, a second voltage application portion to which a second voltage different from the first voltage is applied, a first charge detection portion, a second charge detection portion, and a through electrode extending through the semiconductor layer. The light reception device is configured such that a third voltage is applied through the through electrode to a film formed on a face of the semiconductor layer on the on-chip lens side. The present technology can be applied to a light reception device that generates distance information, for example, by a ToF method or the like.
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公开(公告)号:US11362123B2
公开(公告)日:2022-06-14
申请号:US16638520
申请日:2018-08-08
发明人: Tomoharu Ogita
IPC分类号: H01L27/146 , H04N5/369 , G02B7/04
摘要: The present technology relates to an imaging device, a camera module, and an electronic apparatus that make it possible to reduce a profile of the camera module and to enhance sensitivity. The imaging device includes: a semiconductor substrate in which a light receiving section is formed that includes a plurality of pixels performing photoelectric conversion; and a reinforcing member that is disposed on side of the light receiving section of the semiconductor substrate and includes an opening in which a part opposed to the light receiving section is opened. The present technology is applicable to, for example, an imaging device that captures an image, a camera module that focuses light to capture an image, an electronic apparatus equipped with a camera function, a vehicle control system that is mounted on a vehicle, an endoscopic surgery system that is used in an endoscopic surgery, and the like.
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公开(公告)号:US11024663B2
公开(公告)日:2021-06-01
申请号:US16496752
申请日:2018-03-16
发明人: Hidenobu Tsugawa , Tomoharu Ogita
IPC分类号: H01L27/146 , A61B1/05 , H04N5/369 , B60R11/04 , B60R16/023 , G05D1/02
摘要: The present technology relates a solid-state imaging element, an electronic apparatus, and a semiconductor device each of which enables deterioration of electrical characteristics in a well region of a semiconductor element formed in a thinned semiconductor substrate to be restrained. A solid-state imaging element as a first aspect of the present technology is a solid-state imaging element constituted by laminating semiconductor substrates in three or more layers, in which of the laminated semiconductor substrates, at least one sheet of the semiconductor substrate is thinned, and an impurity region whose carrier type is the same as that of the thinned semiconductor substrate is formed between a well region and a thinned surface portion in the thinned semiconductor substrate. The present technology can, for example, be applied to a CMOS image sensor.
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