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1.
公开(公告)号:US20190128894A1
公开(公告)日:2019-05-02
申请号:US15801070
申请日:2017-11-01
Applicant: STC.UNM
Inventor: Ravinder Jain , Abhaya K. Datye , Ying-Bing Jiang
Abstract: A method of making free-standing ALD-coated plasmonic nanoparticles. The method comprises providing a plurality of semiconductor quantum dots. One or more conformal layers of dielectric material are deposited over the quantum dots to form dielectric-coated quantum dots. A conformal metallic nanoshell is deposted over the dielectric-coated quantum dots to form plasmonic nanoparticles. At least one layer chosen from i) the conformal layers of dielectric material and ii) the conformal metallic nanoshell is deposited using a vapor phase atomic layer deposition (ALD) process. Plasmonic nanoparticles and systems employing the nanoparticles are also disclosed.
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2.
公开(公告)号:US20210016230A1
公开(公告)日:2021-01-21
申请号:US16903608
申请日:2020-06-17
Inventor: Hongyou Fan , Susan Rempe , Ying-Bing Jiang
Abstract: A nanoporous polymer membrane with vertically aligned pore channels can be synthesized through self-assembly of amphiphilic block copolymers on a supporting substrate. The pore surface chemistry can be functionalized for selective anion transport,?
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3.
公开(公告)号:US11517858B2
公开(公告)日:2022-12-06
申请号:US16903608
申请日:2020-06-17
Inventor: Hongyou Fan , Susan Rempe , Ying-Bing Jiang
Abstract: A nanoporous polymer membrane with vertically aligned pore channels can be synthesized through self-assembly of amphiphilic block copolymers on a supporting substrate. The pore surface chemistry can be functionalized for selective anion transport.
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公开(公告)号:US09605344B2
公开(公告)日:2017-03-28
申请号:US14917566
申请日:2014-09-12
Applicant: STC.UNM
Inventor: Ying-Bing Jiang , Joseph L. Cecchi , Yaqin Fu , C. Jeffrey Brinker
IPC: C23C16/455 , C23C16/46
CPC classification number: C23C16/45525 , C23C16/45534 , C23C16/46
Abstract: An atomic layer deposition method is disclosed for preparing polypeptides. The method comprises providing a solid-phase support comprising a reactive amine monolayer in an atomic layer deposition (ALD) chamber. The solid-phase support is contacted with a first protected amino acid substituted with a protecting group by atomic layer deposition, wherein the protecting group is bonded to a non-side chain amino group of the protected amino acid. A carboxylic acid group of the first protected amino acid is reacted with the reactive amine monolayer, thereby coupling the first protected amino acid to the solid-phase support to produce a coupled-product.
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