Defect detector and defect detecting method
    4.
    发明申请
    Defect detector and defect detecting method 有权
    缺陷检测器和缺陷检测方法

    公开(公告)号:US20060124874A1

    公开(公告)日:2006-06-15

    申请号:US10536715

    申请日:2003-11-27

    IPC分类号: G01N21/00 G01N21/88

    摘要: A defects inspecting apparatus having: a scanning stage for running into a predetermined direction while mounting an inspection target substrate thereon; an illumination optic system for irradiating an illumination light beam upon a surface of the inspection target substrate at a predetermined angle inclined thereto; a detection optic system including, an upper-directed photo-detector for receiving upper-directed reflected/scattered lights emitting upwards from the inspection target substrate, thereby converting them into an upper-directed image signal, and a side-directed photo-detector for receiving side-directed reflected/scattered lights emitting for the inspection target substrate into an inclined direction, so as to flatly intersects the illumination light beam, and thereby converting into a side-directed image signal; and a signal processing system-for detecting defects upon basis of the upper-directed image signal and the side-directed image signal.

    摘要翻译: 一种缺陷检查装置,具有:在其上安装检查对象基板的同时沿预定方向行进的扫描台; 照明光学系统,用于以与其倾斜的预定角度将照明光束照射在检查对象基板的表面上; 检测光学系统,包括:用于接收从检查对象基板向上发射的上方反射/散射光的上方光检测器,从而将其转换为高定向图像信号;以及侧向光检测器, 将检测对象基板发射的侧向反射/散射光倾斜到倾斜方向,以与照明光束平坦地相交,从而转换为侧向图像信号; 以及信号处理系统 - 用于基于上限图像信号和侧向图像信号来检测缺陷。

    Defect detector and defect detecting method
    9.
    发明授权
    Defect detector and defect detecting method 有权
    缺陷检测器和缺陷检测方法

    公开(公告)号:US07417721B2

    公开(公告)日:2008-08-26

    申请号:US10536715

    申请日:2003-11-27

    IPC分类号: G01N21/00

    摘要: A defects inspecting apparatus having: a scanning stage for running into a predetermined direction while mounting an inspection target substrate thereon; an illumination optic system for irradiating an illumination light beam upon a surface of the inspection target substrate at a predetermined angle inclined thereto; a detection optic system including, an upper-directed photo-detector for receiving upper-directed reflected/scattered lights emitting upwards from the inspection target substrate, thereby converting them into an upper-directed image signal, and a side-directed photo-detector for receiving side-directed reflected/scattered lights emitting for the inspection target substrate into an inclined direction, so as to flatly intersects the illumination light beam, and thereby converting into a side-directed image signal; and a signal processing system-for detecting defects upon basis of the upper-directed image signal and the side-directed image signal.

    摘要翻译: 一种缺陷检查装置,具有:在其上安装检查对象基板的同时沿预定方向行进的扫描台; 照明光学系统,用于以与其倾斜的预定角度将照明光束照射在检查对象基板的表面上; 检测光学系统,包括:用于接收从检查对象基板向上发射的上方反射/散射光的上位光检测器,从而将其转换为高定向图像信号;以及侧向光检测器, 将检测对象基板发射的侧向反射/散射光倾斜到倾斜方向,以与照明光束平坦地相交,从而转换为侧向图像信号; 以及信号处理系统 - 用于基于上限图像信号和侧向图像信号来检测缺陷。

    Method for inspecting defect and apparatus for inspecting defect
    10.
    发明授权
    Method for inspecting defect and apparatus for inspecting defect 有权
    检查缺陷的方法和缺陷检查装置

    公开(公告)号:US07586594B2

    公开(公告)日:2009-09-08

    申请号:US11770217

    申请日:2007-06-28

    IPC分类号: G01N21/00

    摘要: The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

    摘要翻译: 本发明是用于检查异物的缺陷的装置,包括照明光学系统,检测光学系统,屏蔽单元,其设置在所述检测光学系统中,以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统,其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶,或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜,或通过加热,突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。