公开(公告)号：US20230064938A1

公开(公告)日：2023-03-02

申请号：US17899508

申请日：2022-08-30

Applicant: Samsung Display Co., Ltd.

Inventor： Youngdae Kim ,  Sangjin Park ,  Chadong Kim ,  Donghyun Yang

IPC: H01L27/32

Abstract: A display apparatus includes a substrate, a thin film transistor, a first inorganic insulating layer, a first organic insulating layer, a second inorganic insulating layer, and a second organic insulating layer. The thin film transistor is over the substrate and includes a semiconductor layer and a gate electrode. The first inorganic insulating layer includes a first insulating layer between the semiconductor layer and the gate electrode of the thin film transistor and a second insulating layer over the gate electrode. The first organic insulating layer is over the first inorganic insulating layer. The second inorganic insulating layer is over the first organic insulating layer. The second organic insulating layer is over the second inorganic insulating layer. At least one hole passing through the first inorganic insulating layer and the second inorganic insulating layer is formed in a peripheral portion of the thin film transistor.

公开(公告)号：US09851635B2

公开(公告)日：2017-12-26

申请号：US14801111

申请日：2015-07-16

Applicant: SAMSUNG DISPLAY CO., LTD. ,  AZ ELECTRONIC MATERIALS (LUXEMBOURG) SARL

Inventor： Chadong Kim ,  Hoon Kang ,  Wooyong Sung ,  Hikuk Lee ,  Changhoon Kim ,  Jungin Park ,  Sanghyun Yun ,  Kibeom Lee ,  Jaehyuk Chang ,  Deokman Kang ,  Younsuk Kim ,  Saetae Oh

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/40 ,  G03F7/038 ,  C07D213/02 ,  G03F7/00 ,  H01L21/00

CPC classification number: G03F7/004 ,  C07D213/02 ,  G03F7/0007 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0384 ,  G03F7/20 ,  G03F7/2057 ,  G03F7/40 ,  H01L21/00

Abstract: A photoresist composition includes an alkali soluble resin, a hardening agent, a photo acid generator, and an organic solvent. The photo acid generator may be represented by Formula 1, in which L11 is selected from a single bond, a C1-C10 alkylene group, a C2-C10 alkenylene group, and a C2-C10 alkynylene group; and R11 is selected from a C6-C15 aryl group, or a C6-C15 aryl group with at least one substitutent group selected from a group comprising deuterium, a hydroxyl group, a C1-C10 alkyl group, a C1-C10 alkoxy group, and a C6-C15 aryl group.