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1.Photoresist composition and method of forming a black matrix using the same 有权
Title translation: 光刻胶组合物和使用其形成黑色矩阵的方法公开(公告)号:US09017921B2
公开(公告)日:2015-04-28
申请号:US13853395
申请日:2013-03-29
Applicant: Samsung Display Co., Ltd.
Inventor: Soo-Hye Ryu , Yi-Seop Shim , Chang-soon Jang , Chul Huh
CPC classification number: G03F7/20 , C09B69/10 , C09D11/328 , G03C1/52 , G03F7/0007 , G03F7/004 , G03F7/031 , G03F7/033 , G03F7/105
Abstract: A photoresist composition includes a binder resin combined with a black dye, a monomer, a photo-polymerization initiator and a remainder of a solvent.
Abstract translation: 光致抗蚀剂组合物包括与黑色染料,单体,光聚合引发剂和剩余的溶剂组合的粘合剂树脂。