METHOD OF MONITORING A LASER BEAM AND LASER IRRADIATION APPARATUS USING THE SAME
    1.
    发明申请
    METHOD OF MONITORING A LASER BEAM AND LASER IRRADIATION APPARATUS USING THE SAME 审中-公开
    使用激光束和激光照射装置监测其方法

    公开(公告)号:US20150034614A1

    公开(公告)日:2015-02-05

    申请号:US14170350

    申请日:2014-01-31

    CPC classification number: H01L22/20 B23K26/032 B23K26/705 B23K2103/56

    Abstract: A laser irradiation apparatus is provided. The laser irradiation apparatus includes a laser beam generator configured to generate laser beams; a slit unit configured to selectively transmit the laser beams; a mirror unit configured to change a path of the selectively transmitted laser beams, so as to irradiate the selectively transmitted laser beams onto a processing target; a first optical system, wherein a first portion of the selectively transmitted laser beams penetrates through the mirror unit and is projected to the first optical system; and a second optical system, wherein a second portion of the selectively transmitted laser beams penetrates through the mirror unit and is projected to the second optical system.

    Abstract translation: 提供了一种激光照射装置。 激光照射装置包括:激光束发生器,被配置为产生激光束; 狭缝单元,被配置为选择性地透射所述激光束; 被配置为改变选择性透射的激光束的路径的反射镜单元,以便将选择性透射的激光束照射到处理目标上; 第一光学系统,其中所述选择性透射的激光束的第一部分穿透所述反射镜单元并被投影到所述第一光学系统; 以及第二光学系统,其中所述选择性透射的激光束的第二部分穿过所述反射镜单元并被投影到所述第二光学系统。

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