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公开(公告)号:US12272606B2
公开(公告)日:2025-04-08
申请号:US18300983
申请日:2023-04-14
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sangmin Yoo , Juyoun Kim , Hyungjoo Na , Bongseok Suh , Jooho Jung , Euichul Hwang , Sungmoon Lee
IPC: H01L21/8238 , H01L21/762 , H01L27/118
Abstract: A semiconductor device is provided. The semiconductor device includes a substrate including an active pattern, a gate electrode extending in a first direction and crossing the active pattern which extends in a second direction, a separation structure crossing the active pattern and extending in the first direction, a first gate dielectric pattern disposed on a side surface of the gate electrode, a second gate dielectric pattern disposed on a side surface of the separation structure, and a gate capping pattern covering a top surface of the gate electrode. A level of a top surface of the separation structure is higher than a level of a top surface of the gate capping pattern.
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公开(公告)号:US11062961B2
公开(公告)日:2021-07-13
申请号:US16408912
申请日:2019-05-10
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sangmin Yoo , Juyoun Kim , Hyungjoo Na , Bongseok Suh , Jooho Jung , Euichul Hwang , Sungmoon Lee
IPC: H01L27/088 , H01L21/8234 , H01L23/522 , H01L29/06 , H01L29/66 , H01L21/311 , H01L21/8238 , H01L27/118 , H01L21/762
Abstract: A semiconductor device is provided. The semiconductor device includes a substrate including an active pattern, a gate electrode extending in a first direction and crossing the active pattern which extends in a second direction, a separation structure crossing the active pattern and extending in the first direction, a first gate dielectric pattern disposed on a side surface of the gate electrode, a second gate dielectric pattern disposed on a side surface of the separation structure, and a gate capping pattern covering a top surface of the gate electrode. A level of a top surface of the separation structure is higher than a level of a top surface of the gate capping pattern.
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公开(公告)号:US11658075B2
公开(公告)日:2023-05-23
申请号:US17246778
申请日:2021-05-03
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sangmin Yoo , Juyoun Kim , Hyungjoo Na , Bongseok Suh , Jooho Jung , Euichul Hwang , Sungmoon Lee
IPC: H01L27/088 , H01L21/8234 , H01L23/522 , H01L29/06 , H01L21/311 , H01L21/8238 , H01L27/118 , H01L21/762
CPC classification number: H01L21/823878 , H01L21/76224 , H01L27/11807 , H01L2027/11816 , H01L2027/11829 , H01L2027/11861
Abstract: A semiconductor device is provided. The semiconductor device includes a substrate including an active pattern, a gate electrode extending in a first direction and crossing the active pattern which extends in a second direction, a separation structure crossing the active pattern and extending in the first direction, a first gate dielectric pattern disposed on a side surface of the gate electrode, a second gate dielectric pattern disposed on a side surface of the separation structure, and a gate capping pattern covering a top surface of the gate electrode. A level of a top surface of the separation structure is higher than a level of a top surface of the gate capping pattern.
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公开(公告)号:US09832370B2
公开(公告)日:2017-11-28
申请号:US14802315
申请日:2015-07-17
Applicant: Samsung Electronics Co., Ltd.
Inventor: Seongho Cho , Youngsoo Park , Euichul Hwang , Myoungjae Lee
CPC classification number: H04N5/23219 , A61B3/113 , A61B5/0037 , A61B5/11 , A61B8/5207 , A61B2576/00 , H04N5/3454
Abstract: A cognitive sensor and a method of operating the same. The cognitive sensor includes a sensor unit, which generates electric signals in response to outside stimulations; a signal processing unit, which generates sensed data regarding the outside stimulations by processing electric signals generated by the sensor unit; a cognitive circuit unit, which specifies an area of interest in the sensed data processed by the signal processing unit; and an output unit, which outputs the sensed data generated by the signal processing unit, wherein at least a portion of the sensed data output by the output unit is sensed data regarding the area of interest.
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