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公开(公告)号:US20240327338A1
公开(公告)日:2024-10-03
申请号:US18483895
申请日:2023-10-10
Applicant: Samsung Electronics Co., Ltd.
Inventor: Aram JEON , Hana KIM , Beomseok KIM , Hoyoon PARK , Kyuhyun IM , Jinwon JEON , Sungwon CHOI
IPC: C07C309/58 , C07C309/42 , G03F7/004 , G03F7/029 , G03F7/20
CPC classification number: C07C309/58 , C07C309/42 , G03F7/0045 , G03F7/0048 , G03F7/029 , G03F7/2004
Abstract: Provided are an organic salt represented by Formula 1, a resist composition including the same, and a method of forming a pattern by using the same:
A11+B11− Formula 1
wherein, in Formula 1,
A11+ is represented by Formula 1A, and B11− is represented by Formula 1B,
wherein descriptions of R11 to R13, L21, L22, a21, a22, R21, R22, Rf, b22, c11 and n11 in Formulae 1A and 1B are provided herein.-
公开(公告)号:US20250102906A1
公开(公告)日:2025-03-27
申请号:US18420038
申请日:2024-01-23
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jinwon JEON , Haengdeog KOH , Yoonhyun KWAK , Mijeong KIM , Sunyoung LEE , Changheon LEE , Kyuhyun IM , Jungha CHAE , Minyoung HA
Abstract: Provided are an organometallic compound represented by one of Formulae 1-1 to 1-4, a resist composition including the same, and a pattern formation method using the resist composition: M11, Q11 to Q14, b11 to b14, R11 to R14, Y11 to Y13, and X11 to X14 in Formulae 1-1 to 1-4 are as described in the specification.
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公开(公告)号:US20240319592A1
公开(公告)日:2024-09-26
申请号:US18491310
申请日:2023-10-20
Applicant: Samsung Electronics Co., Ltd.
Inventor: Changheon LEE , Haengdeog KOH , Yoonhyun KWAK , Mijeong KIM , Sunyoung LEE , Kyuhyun IM , Jinwon JEON , Jungha CHAE , Sunghyun HAN
CPC classification number: G03F7/0042 , G03F7/0048 , G03F7/0382
Abstract: Provided are a resist composition and a method of forming a pattern using the same, wherein the resist composition may include an organometallic compound represented by Formula 1 below, and a polymer including a repeating unit represented by Formula 2 below.
For a description of M11, R11, R12, n, A21, L21 to L23, A21 to a23, R21 to R22, b22, and p in Formula 1 and Formula 2, the specification is referred to.
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