公开(公告)号：US20240255847A1

公开(公告)日：2024-08-01

申请号：US18404865

申请日：2024-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hana KIM ,  Yoonhyun KWAK ,  Hyeran KIM ,  Beomseok KIM ,  Hoyoon PARK ,  Sunyoung LEE ,  Minyoung HA

IPC: G03F7/004 ,  G03F7/039

CPC classification number: G03F7/0045 ,  G03F7/0048 ,  G03F7/039

Abstract: Provided are an organic salt represented by Formula 1 below, a photoresist composition including the same, and a method of forming a pattern by using the photoresist composition:






For descriptions of L1, n1, R1, and A+ in Formula 1, refer to those provided herein.

公开(公告)号：US20250102906A1

公开(公告)日：2025-03-27

申请号：US18420038

申请日：2024-01-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jinwon JEON ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Mijeong KIM ,  Sunyoung LEE ,  Changheon LEE ,  Kyuhyun IM ,  Jungha CHAE ,  Minyoung HA

IPC: G03F7/004 ,  C07F7/22

Abstract: Provided are an organometallic compound represented by one of Formulae 1-1 to 1-4, a resist composition including the same, and a pattern formation method using the resist composition: M11, Q11 to Q14, b11 to b14, R11 to R14, Y11 to Y13, and X11 to X14 in Formulae 1-1 to 1-4 are as described in the specification.

公开(公告)号：US20240043592A1

公开(公告)日：2024-02-08

申请号：US18068365

申请日：2022-12-19

Applicant: Samsung Electronics Co., Ltd.,

Inventor： Minsang KIM ,  Haengdeog KOH ,  Yoonhyun KWAK ,  Chanjae AHN ,  Jungha CHAE ,  Sungwon CHOI ,  Minyoung HA

IPC: C08F220/18 ,  C07C381/12 ,  G03F7/039 ,  G03F7/038 ,  C08F212/14

CPC classification number: C08F220/1807 ,  C07C381/12 ,  G03F7/039 ,  G03F7/038 ,  C08F212/24

Abstract: Provided are a polymer including a repeating unit represented by Formula 1, a photoresist composition including the polymer, and a method of forming a pattern by using the photoresist composition:




wherein the details of R11, L11, a11, A11−, and B11+in Formula 1 are provided in the present specification.