公开(公告)号：US20170186615A1

公开(公告)日：2017-06-29

申请号：US15337145

申请日：2016-10-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Ju-young KIM ,  Jeong-ju PARK ,  Jin PARK ,  Hai-sub NA

IPC: H01L21/033 ,  C11D1/00 ,  H01L21/027 ,  C11D11/00

CPC classification number: H01L21/0337 ,  C11D1/00 ,  C11D11/0047 ,  G03F7/42 ,  H01L21/0274 ,  H01L21/0332

Abstract: A rinse solution includes a surfactant and deionized water. The surfactant includes a compound having a branched structure, the compound having a branched structure including a hydrophobic group-containing main chain and a plurality of side chains that are branched from the main chain and have at least one hydrophilic functional group. A method of fabricating an integrated circuit device includes forming a photoresist pattern, followed by applying the rinse solution onto the photoresist pattern.