Image sensors and methods of forming the same

    公开(公告)号:US10418403B2

    公开(公告)日:2019-09-17

    申请号:US16026265

    申请日:2018-07-03

    Abstract: An image sensor includes a substrate including a plurality of pixel regions and having a trench between the pixel regions, a photoelectric conversion part in the substrate of each of the pixel regions, and a device isolation pattern in the trench. The device isolation pattern defines an air gap. The device isolation pattern has an intermediate portion and an upper portion narrower than the intermediate portion.

    Image sensors and methods of forming the same

    公开(公告)号:US10032819B2

    公开(公告)日:2018-07-24

    申请号:US14994230

    申请日:2016-01-13

    Abstract: An image sensor includes a substrate including a plurality of pixel regions and having a trench between the pixel regions, a photoelectric conversion part in the substrate of each of the pixel regions, and a device isolation pattern in the trench. The device isolation pattern defines an air gap. The device isolation pattern has an intermediate portion and an upper portion narrower than the intermediate portion.

    Image sensors and methods of forming the same

    公开(公告)号:US11211420B2

    公开(公告)日:2021-12-28

    申请号:US17014269

    申请日:2020-09-08

    Abstract: An image sensor includes a substrate including a plurality of pixel regions and having a trench between the pixel regions, a photoelectric conversion part in the substrate of each of the pixel regions, and a device isolation pattern in the trench. The device isolation pattern defines an air gap. The device isolation pattern has an intermediate portion and an upper portion narrower than the intermediate portion.

    Image sensors and methods of forming the same

    公开(公告)号:US10797095B2

    公开(公告)日:2020-10-06

    申请号:US16570142

    申请日:2019-09-13

    Abstract: An image sensor includes a substrate including a plurality of pixel regions and having a trench between the pixel regions, a photoelectric conversion part in the substrate of each of the pixel regions, and a device isolation pattern in the trench. The device isolation pattern defines an air gap. The device isolation pattern has an intermediate portion and an upper portion narrower than the intermediate portion.

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