公开(公告)号：US20240319593A1

公开(公告)日：2024-09-26

申请号：US18381335

申请日：2023-10-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yool Kang ,  Taehui Kwon ,  Dongjun Kim ,  Ahram Suh ,  Miyeon Jung ,  Samjong Choi ,  Ohhwan Kweon ,  Minki Kim ,  Jaehyun Kim ,  Sunggun Shin ,  Seungryul Yoo ,  Heekyung Lee

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0048 ,  G03F7/2004

Abstract: Provided are a thinner composition, which may be generally used for an extreme ultraviolet (EUV) photoresist as well as KrF and ArF photoresists and exhibits improved performance in reduced resist coating (RRC) and edge bead removal (EBR), and which has an excellent pipe cleaning capability, and a method of treating a substrate surface by using the thinner composition. The thinner composition includes a C2-C4 alkylene glycol C1-C4 alkyl ether acetate, a C2-C3 alkylene glycol C1-C4 alkyl ether, and a cycloketone.