MASS FLOW CONTROLLER, APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MAINTENANCE THEREOF

    公开(公告)号:US20190170563A1

    公开(公告)日:2019-06-06

    申请号:US16013199

    申请日:2018-06-20

    Abstract: Disclosed are mass flow controllers, apparatuses for manufacturing semiconductor devices, and methods of maintenance thereof. The mass flow controller may control an amount of a gas provided into a chamber. The mass flow controller may be configured to obtain an absolute volume of the gas provided into the chamber at a standard flow rate when the mass flow controller is initially used. The mass flow controller may be configured to obtain a detected flow rate of the gas provided at a measured flow rate after the mass flow controller has been used for a predetermined time. The mass flow controller may be configured to compare the detected flow rate and the standard flow rate to verify a full-scale error in the measured flow rate.

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