POLISHING SLURRY COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME

    公开(公告)号:US20250066641A1

    公开(公告)日:2025-02-27

    申请号:US18602177

    申请日:2024-03-12

    Inventor: Sanghwa LEE

    Abstract: A polishing slurry composition may include water and an abrasive including a cerium-based metal organic framework. The cerium-based metal organic framework may have a three-dimensional (3D) network structure including a plurality of cerium hexanuclear nanoclusters and a plurality of organic linkers. Each of the plurality of cerium hexanuclear nanoclusters may include six cerium atoms and each of the plurality of organic linkers may be connected between two corresponding cerium hexanuclear nanoclusters among the plurality of cerium hexanuclear nanoclusters. A method of manufacturing an integrated circuit (IC) device may include forming a film to be polished on a substrate, and polishing the film to be polished by performing a chemical mechanical polishing (CMP) process using the polishing slurry composition.

    ELECTRONIC DEVICE PROVIDING EXERCISE GUIDE AND METHOD OF OPERATING THE ELECTRONIC DEVICE
    3.
    发明申请
    ELECTRONIC DEVICE PROVIDING EXERCISE GUIDE AND METHOD OF OPERATING THE ELECTRONIC DEVICE 审中-公开
    提供练习指南的电子设备及操作电子设备的方法

    公开(公告)号:US20170043217A1

    公开(公告)日:2017-02-16

    申请号:US15187334

    申请日:2016-06-20

    Inventor: Sanghwa LEE

    CPC classification number: G09B19/0038 G06K9/00342 G16H20/30

    Abstract: A method and an electronic device for providing an exercise guide is provided. The method includes determining an output period, outputting a guide signal based on the output period, updating the output period of the guide signal based on a motion of a user, and outputting the guide signal based on the updated output period.

    Abstract translation: 提供了一种用于提供锻炼指南的方法和电子装置。 该方法包括确定输出周期,基于输出周期输出引导信号,基于用户的运动来更新引导信号的输出周期,以及基于更新的输出周期输出引导信号。

Patent Agency Ranking