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公开(公告)号：US20230043752A1
公开(公告)日：2023-02-09
申请号：US17813425
申请日：2022-07-19
Applicant: Semes Co., Ltd.
Inventor： Muhyeon LEE , Inryu JEON , Yeonju LEE
IPC: H01L21/67
Abstract: An apparatus for processing a substrate may include a drain box for receiving a solution drained in a predetermined process, a drain line for discharging the solution from the drain box to an outside, and at least one spray member for providing a gas and/or a liquid to block an air flowed into the drain box and/or to control a humidity in the drain box.
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