公开(公告)号：US20210022213A1

公开(公告)日：2021-01-21

申请号：US16932286

申请日：2020-07-17

Applicant: SEMES CO., LTD.

Inventor： Muhyeon LEE ,  Gui Su PARK ,  Byungsun BANG ,  Jungbong CHOI ,  Youngil LEE ,  Kangseop YUN ,  Seung Eun NA ,  Ye Jin CHOI ,  Kyounghwan KIM

IPC: H05B3/00 ,  H05B3/06

Abstract: An apparatus for treating a substrate includes a process chamber having a treatment space defined therein, a support unit for supporting the substrate in the treatment space, a liquid supply unit for supplying treating liquid to the substrate supported on the support unit, and a heating unit disposed in the support unit for heating the substrate supported on the support unit, wherein the heating unit includes a plurality of lamps to heat the substrate, and a window disposed above the lamps to transmit light emitted from the lamps, wherein the window includes a base in a form of a plate, and light adjustment means formed on the base to spread or converge light emitted from the lamps.

公开(公告)号：US20230043752A1

公开(公告)日：2023-02-09

申请号：US17813425

申请日：2022-07-19

Applicant: Semes Co., Ltd.

Inventor： Muhyeon LEE ,  Inryu JEON ,  Yeonju LEE

IPC: H01L21/67

Abstract: An apparatus for processing a substrate may include a drain box for receiving a solution drained in a predetermined process, a drain line for discharging the solution from the drain box to an outside, and at least one spray member for providing a gas and/or a liquid to block an air flowed into the drain box and/or to control a humidity in the drain box.

公开(公告)号：US20210066099A1

公开(公告)日：2021-03-04

申请号：US17011048

申请日：2020-09-03

Applicant: SEMES CO., LTD.

Inventor： Muhyeon LEE ,  Byungsun BANG ,  Heehwan KIM

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/02 ,  B08B3/10

Abstract: A method for processing a substrate includes a liquid treatment step of performing liquid treatment on the substrate by dispensing a treatment liquid onto the rotating substrate and a cleaning step of stopping the dispensing of the treatment liquid and dispensing a cleaning solution onto the substrate. In the cleaning step, a first liquid is dispensed from a first nozzle above the rotating substrate to a point spaced apart from the center of the substrate in a first direction, and a second liquid is dispensed from a second nozzle above the rotating substrate to a point spaced apart from the center of the substrate in a second direction. When viewed from above, the first liquid flows toward the second nozzle after dispensed onto the substrate, and the second liquid flows toward the first nozzle after dispensed onto the substrate.