公开(公告)号：US20150083043A1

公开(公告)日：2015-03-26

申请号：US14556608

申请日：2014-12-01

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Yasuhiro SASAKI ,  Mitsuru Kano

IPC: B05B13/02 ,  B65H20/02

CPC classification number: B05B13/0221 ,  B65H20/02 ,  B65H2301/51145 ,  C23C14/562 ,  C23C16/45551 ,  C23C16/545

Abstract: A rolled film formation apparatus including a first chamber in which a first precursor is applied to a substrate, a second chamber in which a second precursor is applied to the substrate such that the first and second precursors react with each other and that an atomic layer is deposited on the substrate, a third chamber in which a purge gas is applied to the substrate, and conveyance roller pairs which are positioned in the first, second and third chambers, and convey the substrate. Each conveyance roller pair includes a first roller and a second roller which sandwich the substrate in a thickness direction of the substrate. At least one of the first and second rollers has an outer peripheral surface having a surface unevenness. The substrate is moved back and forth among the first, second and third chambers. The atomic layer is deposited more than once on the substrate.

Abstract translation: 一种轧制成膜装置，包括：第一室，其中将第一前体施加到基板;第二室，其中将第二前体施加到所述基板，使得所述第一和第二前体彼此反应，并且原子层为 沉积在基板上的第三室，其中向基板施加吹扫气体，以及传送辊对，其定位在第一，第二和第三室中并传送基板。 每个输送辊对包括在基板的厚度方向夹着基板的第一辊和第二辊。 第一和第二辊中的至少一个具有表面凹凸的外周面。 基板在第一，第二和第三室之间来回移动。 原子层在衬底上沉积不止一次。