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    ROLLED FILM FORMATION APPARATUS
    2.
    发明申请
    ROLLED FILM FORMATION APPARATUS 有权
    滚镀膜成型设备

    公开(公告)号：US20150083043A1

    公开(公告)日：2015-03-26

    申请号：US14556608

    申请日：2014-12-01

    Applicant: TOPPAN PRINTING CO., LTD.

    Inventor： Yasuhiro SASAKI ,  Mitsuru Kano

    IPC: B05B13/02 ,  B65H20/02

    CPC classification number: B05B13/0221 ,  B65H20/02 ,  B65H2301/51145 ,  C23C14/562 ,  C23C16/45551 ,  C23C16/545

    Abstract: A rolled film formation apparatus including a first chamber in which a first precursor is applied to a substrate, a second chamber in which a second precursor is applied to the substrate such that the first and second precursors react with each other and that an atomic layer is deposited on the substrate, a third chamber in which a purge gas is applied to the substrate, and conveyance roller pairs which are positioned in the first, second and third chambers, and convey the substrate. Each conveyance roller pair includes a first roller and a second roller which sandwich the substrate in a thickness direction of the substrate. At least one of the first and second rollers has an outer peripheral surface having a surface unevenness. The substrate is moved back and forth among the first, second and third chambers. The atomic layer is deposited more than once on the substrate.

    Abstract translation: 一种轧制成膜装置，包括：第一室，其中将第一前体施加到基板;第二室，其中将第二前体施加到所述基板，使得所述第一和第二前体彼此反应，并且原子层为 沉积在基板上的第三室，其中向基板施加吹扫气体，以及传送辊对，其定位在第一，第二和第三室中并传送基板。 每个输送辊对包括在基板的厚度方向夹着基板的第一辊和第二辊。 第一和第二辊中的至少一个具有表面凹凸的外周面。 基板在第一，第二和第三室之间来回移动。 原子层在衬底上沉积不止一次。

    Laminate and method for fabricating the same
    6.
    发明授权
    Laminate and method for fabricating the same 有权

    公开(公告)号：US11090917B2

    公开(公告)日：2021-08-17

    申请号：US15730922

    申请日：2017-10-12

    Applicant: TOPPAN PRINTING CO., LTD.

    Inventor： Jin Sato ,  Mitsuru Kano

    IPC: B32B37/02 ,  B32B9/00 ,  C23C16/54 ,  C23C16/02 ,  C23C16/455 ,  C23C16/40 ,  B32B27/06 ,  B32B27/28 ,  C23C14/08 ,  C23C28/04 ,  H01L51/52

    Abstract: A laminate includes a substrate made of an organic polymer having a functional group containing an oxygen atom or a nitrogen atom, a functional layer bonded to the functional group of the organic polymer contained in the substrate and formed by an atomic layer deposition process, and an overcoat layer provided to cover the functional layer and containing transition metal atoms. Because the adhesion between the substrate and the functional layer is improved and the functional layer is protected by the overcoat layer, it is possible to achieve both improved gas barrier properties and/or improved durability against an environmental stress such as heat, humidity and the like.

    LAMINATE, GAS BARRIER FILM, AND MANUFACTURING METHOD THEREFOR
    9.
    发明申请
    LAMINATE, GAS BARRIER FILM, AND MANUFACTURING METHOD THEREFOR 有权
    层压板，气体阻隔膜及其制造方法

    公开(公告)号：US20150292086A1

    公开(公告)日：2015-10-15

    申请号：US14687515

    申请日：2015-04-15

    Applicant: Toppan Printing Co., Ltd.

    Inventor： Jin Sato ,  Mitsuru Kano

    IPC: C23C16/455 ,  C23C16/50 ,  C23C16/02

    CPC classification number: C23C16/45525 ,  B05D3/144 ,  C08J7/045 ,  C08J2367/02 ,  C08J2400/10 ,  C08J2400/104 ,  C08J2400/106 ,  C08L2201/14 ,  C23C16/02 ,  C23C16/45529 ,  C23C16/50

    Abstract: A laminate (1) provided with: a substrate (2); an undercoat layer (3), which is formed on at least a portion of the outer surface of the substrate (2), contains an organic polymer with a functional group, and is formed in a membrane form or film form; and an atomic layer deposition film (4), which contains a precursor (6) that serves as a starting material, is formed so as to cover the surface of the undercoat layer (3), and in which at least some of the precursor (6) are bonded to the functional groups. The linear expansion coefficient of a layered film provided with the substrate (2) and the undercoat layer (3) is from about 1.0×10−5/K to about 8.0×10−5/K.

    Abstract translation: 1.一种层叠体（1），其具备：基板（2）; 在基材（2）的外表面的至少一部分上形成的底涂层（3）含有具有官能团的有机聚合物，并且以膜形式或膜形式形成; 并且形成含有作为原料的前体（6）的原子层沉积膜（4），以覆盖底涂层（3）的表面，并且其中至少一些前体（ 6）键合到官能团。 设置有基板（2）和底涂层（3）的层状膜的线膨胀系数为约1.0×10-5 / K至约8.0×10-5 / K。

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