公开(公告)号：US10983447B2

公开(公告)日：2021-04-20

申请号：US15704549

申请日：2017-09-14

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Fu Lin ,  Shih-Chang Shih ,  Chia-Chen Chen

IPC: B01D53/04 ,  G03F7/20 ,  C23C16/44 ,  B01D53/30

Abstract: The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe having a top surface and a bottom surface; a first branch pipe including an upstream end coupled to a source of a gas mixture containing the hazardous gas and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.

公开(公告)号：US20240310741A1

公开(公告)日：2024-09-19

申请号：US18673669

申请日：2024-05-24

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Fu Lin ,  Shih-Chang Shih ,  Chia-Chen Chen

IPC: G03F7/00 ,  B01D53/04 ,  B01D53/30 ,  C23C16/44

CPC classification number: G03F7/70858 ,  B01D53/0407 ,  B01D53/30 ,  C23C16/4412 ,  B01D2257/108 ,  B01D2257/553 ,  B01D2257/93 ,  B01D2258/0216

Abstract: An exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas includes: a main exhaust pipe above the semiconductor manufacturing equipment and having a top surface on a first side and a bottom surface on a second side, a first branch pipe connected to a source of a gas mixture containing the hazardous gas on the second side and connected to the main exhaust pipe through the top surface, a second branch pipe connected to a gas box on the second side and connected to the main exhaust pipe through the bottom surface, and a detector on the second branch pipe configured to detect presence of the hazardous gas and downstream to the gas box. The first and the second branch pipes are connected to the main exhaust pipe at a first location and a second location, respectively. The first location is more upstream than the second location.

公开(公告)号：US11681232B2

公开(公告)日：2023-06-20

申请号：US17233203

申请日：2021-04-16

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Fu Lin ,  Shih-Chang Shih ,  Chia-Chen Chen

IPC: G03F7/20 ,  G03F7/00 ,  C23C16/44 ,  B01D53/04 ,  B01D53/30

CPC classification number: G03F7/70858 ,  B01D53/0407 ,  B01D53/30 ,  C23C16/4412 ,  B01D2257/108 ,  B01D2257/553 ,  B01D2257/93 ,  B01D2258/0216

Abstract: The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe having a top surface and a bottom surface; a first branch pipe including an upstream end coupled to a source of a gas mixture containing the hazardous gas and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.

公开(公告)号：US10156794B1

公开(公告)日：2018-12-18

申请号：US15692098

申请日：2017-08-31

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Sheng-Kang Yu ,  Yu-Fu Lin ,  Chia-Chen Chen

IPC: G01C15/10 ,  G02B26/08 ,  G01B11/27 ,  G03F7/20 ,  H01L21/033 ,  H01L21/308 ,  H01L21/68 ,  G01B11/16 ,  G01B11/26 ,  G01D5/26 ,  G03F7/00

Abstract: Positioning devices and positioning methods are provided. The positioning device includes a laser source and an optical assembly. The optical assembly is configured to direct a laser beam projected from the laser source toward a floor and a ceiling of a semiconductor fabrication facility to generate a first laser line on the floor and a second laser line on the ceiling. The first laser line and the second laser line are parallel to and aligned with each other when viewed in a direction perpendicular to the floor and the ceiling. Accordingly, the first laser line and the second laser line can be used to align a semiconductor tool and an overhead hoist transport system in the semiconductor fabrication facility.

公开(公告)号：US12276923B2

公开(公告)日：2025-04-15

申请号：US18673669

申请日：2024-05-24

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Fu Lin ,  Shih-Chang Shih ,  Chia-Chen Chen

IPC: G03F7/00 ,  B01D53/04 ,  B01D53/30 ,  C23C16/44

Abstract: An exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas includes: a main exhaust pipe above the semiconductor manufacturing equipment and having a top surface on a first side and a bottom surface on a second side, a first branch pipe connected to a source of a gas mixture containing the hazardous gas on the second side and connected to the main exhaust pipe through the top surface, a second branch pipe connected to a gas box on the second side and connected to the main exhaust pipe through the bottom surface, and a detector on the second branch pipe configured to detect presence of the hazardous gas and downstream to the gas box. The first and the second branch pipes are connected to the main exhaust pipe at a first location and a second location, respectively. The first location is more upstream than the second location.

公开(公告)号：US20210232054A1

公开(公告)日：2021-07-29

申请号：US17233203

申请日：2021-04-16

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Fu Lin ,  Shih-Chang Shih ,  Chia-Chen Chen

IPC: G03F7/20 ,  C23C16/44 ,  B01D53/04 ,  B01D53/30

Abstract: The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe having a top surface and a bottom surface; a first branch pipe including an upstream end coupled to a source of a gas mixture containing the hazardous gas and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.

公开(公告)号：US11054756B2

公开(公告)日：2021-07-06

申请号：US16902087

申请日：2020-06-15

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

Inventor： Yu-Fu Lin ,  Tung-Jung Chang ,  Chia-Chen Chen

IPC: G03B27/42 ,  G03F7/20 ,  B08B3/12 ,  B08B7/02

Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.

公开(公告)号：US20190079418A1

公开(公告)日：2019-03-14

申请号：US15704549

申请日：2017-09-14

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Fu Lin ,  Shih-Chang Shih ,  Chia-Chen Chen

IPC: G03F7/20

Abstract: The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe having a top surface and a bottom surface; a first branch pipe including an upstream end coupled to a source of a gas mixture containing the hazardous gas and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.

公开(公告)号：US11994809B2

公开(公告)日：2024-05-28

申请号：US18337574

申请日：2023-06-20

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Fu Lin ,  Shih-Chang Shih ,  Chia-Chen Chen

IPC: G03F7/00 ,  B01D53/04 ,  B01D53/30 ,  C23C16/44

CPC classification number: G03F7/70858 ,  B01D53/0407 ,  B01D53/30 ,  C23C16/4412 ,  B01D2257/108 ,  B01D2257/553 ,  B01D2257/93 ,  B01D2258/0216

Abstract: The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe positioned above the semiconductor manufacturing equipment and having a top surface and a bottom surface extending parallel to the top surface; a first branch pipe including an upstream end coupled to a source of a gas mixture and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including an upstream end and a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.

公开(公告)号：US20230333489A1

公开(公告)日：2023-10-19

申请号：US18337574

申请日：2023-06-20

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Yu-Fu Lin ,  Shih-Chang Shih ,  Chia-Chen Chen

IPC: G03F7/20 ,  C23C16/44 ,  B01D53/04 ,  B01D53/30

CPC classification number: G03F7/70858 ,  C23C16/4412 ,  B01D53/0407 ,  B01D53/30 ,  B01D2257/93 ,  B01D2258/0216 ,  B01D2257/108 ,  B01D2257/553

Abstract: The present disclosure provides an exhaust system for discharging from semiconductor manufacturing equipment a hazardous gas. The exhaust system includes: a main exhaust pipe positioned above the semiconductor manufacturing equipment and having a top surface and a bottom surface extending parallel to the top surface; a first branch pipe including an upstream end coupled to a source of a gas mixture and a downstream end connected to the main exhaust pipe through the top surface; a second branch pipe including an upstream end and a downstream end connected to the main exhaust pipe through the bottom surface; and a detector configured to detect presence of the hazardous gas in the second branch pipe.