公开(公告)号：US20040141163A1

公开(公告)日：2004-07-22

申请号：US10747737

申请日：2003-12-29

Applicant: The University of Texas System, Board of Regents, UT System

Inventor： Todd Bailey ,  Byung J. Choi ,  Matthew E. Colburn ,  S. V. Sreenivasan ,  C. Grant Willson ,  John Ekerdt

IPC: G03B027/00 ,  G03B027/62

CPC classification number: G11B5/855 ,  B29C35/0888 ,  B29C37/0053 ,  B29C43/003 ,  B29C2035/0827 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00 ,  Y10S977/887

Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder. The template holder may include a body with an opening configured to receive the template, a support plate, and at least one piezo actuator coupled to the body. The piezo actuator may be configured to alter a physical dimension of the template during use.

Abstract translation: 描述了压印光刻模板，形成和使用模板的方法以及模板保持装置。 压印光刻模板可以包括在主体的表面上具有多个凹部的主体。 身体可以是对于激活光是基本上透明的材料。 多个凹部的至少一部分可以限定具有小于约250nm的特征尺寸的特征。 可以通过获得对于激活光而基本上透明并在模板的表面上形成多个或多个凹陷的材料来形成模板。 在一些实施例中，模板还可以包括至少一个对准标记。 在一些实施例中，模板还可以包括间隙感测区域。 可以使用压印光刻模板来在设置在基板上的可光固化液体中形成印刷层。 在使用期间，模板可以设置在模板保持器内。 模板保持器可以包括具有构造成接收模板的开口的主体，支撑板和耦合到主体的至少一个压电致动器。 压电致动器可以被配置为在使用期间改变模板的物理尺寸。

公开(公告)号：US20040141168A1

公开(公告)日：2004-07-22

申请号：US10747795

申请日：2003-12-29

Applicant: The University of Texas System Board of Regents, UT System

Inventor： S. V. Sreenivasan ,  Byung J. Choi ,  Matthew Colburn ,  Todd Bailey

IPC: G03B027/62 ,  G03B027/42

CPC classification number: B29C35/0888 ,  B29C37/0053 ,  B29C43/003 ,  B29C43/021 ,  B29C2035/0827 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00 ,  Y10S101/36 ,  Y10T428/24802

Abstract: A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.

Abstract translation: 描述了在压印光刻工艺期间确定和校正对准的系统。 在压印光刻工艺期间，模板可以通过使用设置在模板和衬底上的对准标记与衬底对准。 可以在层被处理之前确定和校正对准。