公开(公告)号：US20040141168A1

公开(公告)日：2004-07-22

申请号：US10747795

申请日：2003-12-29

Applicant: The University of Texas System Board of Regents, UT System

Inventor： S. V. Sreenivasan ,  Byung J. Choi ,  Matthew Colburn ,  Todd Bailey

IPC: G03B027/62 ,  G03B027/42

CPC classification number: B29C35/0888 ,  B29C37/0053 ,  B29C43/003 ,  B29C43/021 ,  B29C2035/0827 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00 ,  Y10S101/36 ,  Y10T428/24802

Abstract: A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.

Abstract translation: 描述了在压印光刻工艺期间确定和校正对准的系统。 在压印光刻工艺期间，模板可以通过使用设置在模板和衬底上的对准标记与衬底对准。 可以在层被处理之前确定和校正对准。