摘要:
In the read amplifier a mismatch of the inception voltages of cross-coupled transistors (M5, M6) of the read amplifier are compensated by four further transistors (M1 . . . M4), whereby a defined equalizing of the bitlines advantageously takes place with these further transistors simultaneously in what is called the equalize phase. The compensation takes place in that the bitline that is connected with the transistor with the lower inception voltage is charged to a higher level in the pre-load phase. This higher bitline level is switched to the gate of the transistor connected with the other bitline. In the evaluation phase the transistor with the higher inception voltage becomes more strongly conductive. Read amplifiers of this sort are most significant for memory generations beginning at 1 Gbit, since the mismatch due to the variation of the input voltages of the transistors can no longer usefully be solved by a correspondingly large gate surface of the cross-coupled transistors in the read amplifier.
摘要:
The present method reduces variations in noise and temperature in a mixed-signal circuit including memory. Memory electrically proximate an analog circuit is provided and a digital data word received at the memory. When the data word is not a desired data word, a dummy write to the memory is performed. When the data word is a desired data word, the data word is written to the memory. The mixed-signal circuit includes an analog circuit, memory electrically proximate to the analog circuit and connected to receive digital data words, and a memory controller connected to the memory. The memory controller is operable to cause the memory to write to the memory each of the data words that is a desired data word and additionally to perform a dummy write to memory for each of the data words that is not a desired data word.
摘要:
Systems and methods are provided for controllably growing nanostructures, such as nanotubes, on a substrate, thus enabling the length and/or orientation of the nanostructures to be selectively controlled. A substrate's surface is selectively patterned to include topological structures, such as a blocking structure protruding from the surface and/or a recess in the surface, for influencing the nanostructure growth along the surface from a catalyst. The topological structures can be located to control the length and/or orientation of the nanostructures differently on different areas of the substrate. The topological structures may be of a substance that chemically inhibits growth of the nanostructure.
摘要:
Systems and methods are provided for limiting the growth of nanostructures, such as nanotubes, from a catalyst layer. More particularly, systems and methods are provided for growing nanostructures from the periphery of a catalyst layer. In certain embodiments, a catalyst layer from which nanostructures can be grown during a growth process, such as CVD or PECVD, is located on a substrate. The catalyst layer is covered with a covering layer such that the catalyst layer is sandwiched between the substrate and the covering layer. The resulting structure then undergoes a nanostructure growth process. Because the catalyst layer is sandwiched between the substrate and the covering layer, growth of nanostructures is limited to growth from nanoparticles located on the periphery of the catalyst layer. Thus, growth of nanostructures does not result from nanoparticles located in an interior region of the catalyst layer.