摘要:
Systems and methods are provided for limiting the growth of nanostructures, such as nanotubes, from a catalyst layer. More particularly, systems and methods are provided for growing nanostructures from the periphery of a catalyst layer. In certain embodiments, a catalyst layer from which nanostructures can be grown during a growth process, such as CVD or PECVD, is located on a substrate. The catalyst layer is covered with a covering layer such that the catalyst layer is sandwiched between the substrate and the covering layer. The resulting structure then undergoes a nanostructure growth process. Because the catalyst layer is sandwiched between the substrate and the covering layer, growth of nanostructures is limited to growth from nanoparticles located on the periphery of the catalyst layer. Thus, growth of nanostructures does not result from nanoparticles located in an interior region of the catalyst layer.
摘要:
Transistors and methods for forming transistors from groups of nanostructures are disclosed herein. The transistor may be formed from an array of nanostructures that are grown vertically on a substrate. The nanostructures may have lower, middle and upper segments that may be formed with different materials and/or doping to achieve desired effects. Collectively, the lower segments may form the source or drain, with the middle segments collectively forming the channel. Alternatively, the lower segments could collectively form the emitter or collector, with the middle segments collectively forming the base. Transistor electrodes may be planar metal structures that surround sidewalls of the nanostructures. The transistors may be Field Effect Transistors (FETs) or bipolar junction transistors (BJTs). Heterojunction bipolar junction transistors (HBTs) and high electron mobility transistors (HEMTs) are possible.
摘要:
Nanostructure array optoelectronic devices are disclosed. The optoelectronic device may have a top electrical contact that is physically and electrically connected to sidewalls of the array of nanostructures (e.g., nanocolumns). The top electrical contact may be located such that light can enter or leave the nanostructures without passing through the top electrical contact. Therefore, the top electrical contact can be opaque to light having wavelengths that are absorbed or generated by active regions in the nanostructures. The top electrical contact can be made from a material that is highly conductive, as no tradeoff needs to be made between optical transparency and electrical conductivity. The device could be a solar cell, LED, photo-detector, etc.
摘要:
A solar cell having back side conductive contacts and method for forming the solar cell is provided. One embodiment is a solar cell having back side conductive contacts. The solar cell has a first region of a first material having a first conductivity over a front side of a substrate, a second region of a second material conformably on the first material, and a third region of a third material having a second conductivity conformably on the second material. The first region, the second region, and the third region form a structure that generates charge carriers from solar radiation. The solar cell has a first conductive contact and a second conductive contact exposed on the back side of the substrate. The first conductive contact is in electrical contact with the first material and the second conductive contact is in electrical contact with the third material.
摘要:
In accordance with embodiments of the invention, strain is reduced in the light emitting layer of a III-nitride device by including a strain-relieved layer in the device. The surface on which the strain-relieved layer is grown is configured such that strain-relieved layer can expand laterally and at least partially relax. In some embodiments of the invention, the strain-relieved layer is grown over a textured semiconductor layer or a mask layer. In some embodiments of the invention, the strain-relieved layer is group of posts of semiconductor material.
摘要:
A method and apparatus for solar cell having graded energy wells is provided. The active region of the solar cell comprises nanostructures. The nanostructures are formed from a material that comprises a III-V compound semiconductor and an element that alters the band gap of the III-V compound semiconductor. For example, the III-V compound semiconductor could be gallium nitride (GaN). As an example, the “band gap altering element” could be indium (In). The concentration of the indium in the active region is non-uniform such that the active region has a number of energy wells, separated by barriers. The energy wells may be “graded”, by which it is meant that the energy wells have a different band gap from one another, generally increasing or decreasing from one well to another monotonically.
摘要:
A measurement inside a specimen is performed by providing a nanoscale FET probe comprising a cantilever element and a nanowire extending from the cantilever element. The nanowire is electrically connected to the cantilever element at at least one of the ends of the nanowire. The nanowire is coated along at least part of the length thereof with molecules of a capture agent. The cantilever element is moved to insert the nanowire onto the specimen. An electrical property of the nanoscale FET probe is monitored to detect binding events between the capture agent molecules and an analyte of interest inside the specimen.
摘要:
The nanoscale FET probe comprises a cantilever element and, at one end of the cantilever element, a nanowire that extends from the cantilever element. The nanowire is electrically connected to the cantilever element at at least one of the ends of the nanowire. The nanowire is capable of being coated with molecules of a capture agent along at least part of its length.
摘要:
The high aspect ratio atomic force microscope (AFM) probe has a cantilever element with a crystalline growth surface at one end. The AFM probe additionally has a semiconductor nanowire extending substantially orthogonally from the growth surface. The AFM probe is made by covering the cantilever element with sacrificial material, leaving at least part of the growth surface exposed; depositing catalyst metal on the exposed growth surface; removing the sacrificial material leaving the catalyst metal on the growth surface, and growing a semiconductor nanowire extending from the growth surface using the catalyst metal left on the growth surface. The catalyst metal remains at the distal end of the nanowire during the growing.
摘要:
A device includes a semiconductor structure comprising a III-nitride light emitting layer disposed between an n-type region and a p-type region and a plurality of layer pairs disposed within one of the n-type region and the p-type region. Each layer pair includes an InGaN layer and pit-filling layer in direct contact with the InGaN layer. The pit-filling layer may fill in pits formed in the InGaN layer.