公开(公告)号：US20140121814A1

公开(公告)日：2014-05-01

申请号：US14063341

申请日：2013-10-25

Applicant: TOKYO ELECTRON LIMITED

Inventor： Junichi OGAWA ,  Youichi NAKAYAMA ,  Keiji OSADA ,  Hiroaki DEWA

IPC: H01L21/67

CPC classification number: G05B19/41865 ,  G05B2219/45031 ,  H01L21/67276 ,  Y02P90/20 ,  Y02P90/86

Abstract: The substrate processing apparatus includes: a plurality of processing modules; a transfer mechanism; a controller; and a setting unit. The processing module processes with respect to the substrate. The transfer mechanism transfers the substrate ejected from the transfer container. The controller outputs control signals for transferring the substrate to the plurality of processing modules along a previously set transfer path through the transfer mechanism sequentially, and for processing with respect to the substrate in the processing module of a transfer destination based on a processing recipe in which a processing order and a processing condition are set. The setting unit sets a content of a non-recipe operation except for operations set in the processing recipe and a performing timing for performing the non-recipe operation by a control operation of the controller every processing module. The non-recipe operation is performed with respect to the processing modules.

Abstract translation: 基板处理装置包括：多个处理模块; 转移机制; 控制器 和设置单元。 处理模块相对于衬底进行处理。 转印机构传送从转印容器排出的基板。 控制器输出控制信号，用于沿预先设定的传送路径顺序地将基板传送到多个处理模块，并且基于处理配方处理转印目的地的处理模块中的基板， 设置处理顺序和处理条件。 设置单元设置除了处理配方中设定的操作以外的非配方操作的内容以及通过控制器每个处理模块的控制操作执行非配方操作的执行定时。 相对于处理模块执行非配方操作。

公开(公告)号：US20150040828A1

公开(公告)日：2015-02-12

申请号：US14455795

申请日：2014-08-08

Applicant: Tokyo Electron Limited

Inventor： Daisuke MORISAWA ,  Junichi OGAWA

IPC: C23C16/52 ,  C23C16/44

CPC classification number: C23C16/4401 ,  H01L21/67276

Abstract: A substrate processing system for sequentially processing substrates includes processing chambers, a transfer unit, and a control unit controlling the processing chambers and the transfer unit. The control unit includes a transfer control unit controlling an operation of the transfer unit, a transfer order setting unit setting a transfer order of substrates to the processing chambers, an accumulation unit for accumulating a film thickness of a formed thin film or the number of processed substrates after completion of previous cleaning or previous pre-coating in the processing chambers, a processing chamber priority determination unit for determining priority of processing the substrates in the processing chambers based on predetermined rules, and an execution instruction unit for executing conditioning in the processing chambers. The control unit prevents the substrates from being simultaneously processed in all processing chambers during one cycle of executing conditioning once in each of the processing chambers.

Abstract translation: 用于顺序处理基板的基板处理系统包括处理室，转印单元和控制处理室和转印单元的控制单元。 控制单元包括控制传送单元的操作的传送控制单元，设置到处理室的基板的传送顺序的传送顺序设置单元，用于累积形成的薄膜的膜厚度的累积单元或被处理的 处理室优先确定单元，用于基于预定规则确定处理室中的基板的处理优先权;以及执行指令单元，用于在处理室中执行调节 。 控制单元防止在每个处理室中执行一次循环的一个循环期间在所有处理室中同时处理基板。