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公开(公告)号:US12244972B2
公开(公告)日:2025-03-04
申请号:US17776800
申请日:2020-11-04
Applicant: Tokyo Electron Limited
Inventor: Yuichiro Kunugimoto , Keishi Hamada , Takafumi Hayama , Motoi Okada , Shoki Hamaguchi
Abstract: A monitoring apparatus for a substrate processing apparatus includes: an imaging unit that captures an image of a nozzle of the substrate processing apparatus and a surface of a substrate held by a substrate holder of the substrate processing apparatus; a monitoring data generation unit that generates monitoring video data based on imaging video data captured by the imaging unit during an execution of a substrate process performed by the substrate processing apparatus including a first process and a second process; and a monitoring condition changing unit that changes a generation condition of the monitoring video data during the execution of the substrate process so that at least a resolution or a number of frames of the monitoring video data during an execution of the second process is different from the monitoring video data during an execution of the first process.
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公开(公告)号:US10248030B2
公开(公告)日:2019-04-02
申请号:US15897477
申请日:2018-02-15
Applicant: TOKYO ELECTRON LIMITED
Inventor: Toyohisa Tsuruda , Yuichiro Kunugimoto , Takafumi Hayama , Keishi Hamada
Abstract: A method for evaluating a process recipe used in a liquid processing apparatus that performs a liquid processing by supplying a processing liquid from a nozzle to a substrate while rotating a holding part horizontally holding the substrate about a vertical axis, includes: storing the process recipe in a first storage part, which includes time-series data of a first combination of parameter values including a position of the nozzle and a rotation speed of the substrate; reading the process recipe from the first storage part; reading a pre-prepared risk data from a second storage part, which is determined by associating a second combination of parameter values with a risk information corresponding to a liquid splash risk; and displaying an assisting data for the first combination of parameter values in the process recipe, based on the process recipe and the pre-prepared risk data read from the first and second storage parts.
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