公开(公告)号：US20250046646A1

公开(公告)日：2025-02-06

申请号：US18782696

申请日：2024-07-24

Applicant: Tokyo Electron Limited

Inventor： Junnosuke TAGUCHI ,  Ryotaro TAKAHASHI

IPC: H01L21/687 ,  H01L21/67

Abstract: A substrate processing apparatus includes a vacuum container, a rotary table provided inside the vacuum container, stages provided along a circumferential direction of the rotary table, and configured to support respective substrates disposed thereon, and a measuring instrument configured to measure characteristics of at least one substrate among the substrates disposed on the stages, wherein the stages are configured to be rotatable relative to the rotary table, wherein the measuring instrument is provided on a circumference of a circle that is centered on a central axis of the rotary table and passes through the stages in a plan view seen from a direction perpendicular to an upper surface of the rotary table.

公开(公告)号：US20200251368A1

公开(公告)日：2020-08-06

申请号：US16778466

申请日：2020-01-31

Applicant: TOKYO ELECTRON LIMITED

Inventor： Ryotaro TAKAHASHI ,  Takehiro SHINDO

IPC: H01L21/68 ,  H01L21/687

Abstract: There is provided a semiconductor manufacturing apparatus including: a stage including a shaft provided to a surface opposite a mounting surface on which a substrate is mounted, and configured to be rotated by a driving force of a motor using the shaft as a rotation axis; a storage part storing a correction information on a rotational angle of the stage for each number of rotations in a plurality of rotations of the stage, the plurality of rotations corresponding to a cycle; and a rotation control part configured to control the motor based on the correction information and control the rotation of the stage.