公开(公告)号：US20230253223A1

公开(公告)日：2023-08-10

申请号：US18102279

申请日：2023-01-27

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tamihiro KOBAYASHI

IPC: H01L21/67 ,  H01L21/66

CPC classification number: H01L21/67259 ,  H01L22/12 ,  H01L21/67248

Abstract: There is provided a substrate processing apparatus. The apparatus comprises: a processing chamber; an attaching plate attached to the processing chamber while being positioned by a first positioning mechanism in a direction in which the processing chamber extends and contracts due to expansion and contraction caused by temperature changes with respect to a predetermined reference position serving as a reference for measuring positional displacement in the processing chamber; and a placing table configured to place a substrate thereon and disposed in the processing chamber via a support mechanism attached to the attaching plate, the support mechanism being positioned by a second positioning mechanism at a position opposite to a position of the first positioning mechanism with respect to the reference position.

公开(公告)号：US20240347321A1

公开(公告)日：2024-10-17

申请号：US18633928

申请日：2024-04-12

Applicant: Tokyo Electron Limited

Inventor： Tamihiro KOBAYASHI ,  Toshifumi KITAHARA

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  H01J37/32513 ,  H01J2237/166

Abstract: A processing apparatus includes a processing container, a main body constituting a lower portion of the processing container, and a lid constituting an upper portion of the processing container, wherein the lid includes a shower plate, a plate portion provided above the shower plate, and a connecting member for connecting the shower plate to the plate portion, a guide groove arranged to face the shower plate is provided in a lower surface of the plate portion, a protruding portion of the connecting member is accommodated in the guide groove, a position of the shower plate with respect to the plate portion is determined by accommodating the protruding portion in a first end of the guide groove, and in a state in which the protruding portion is accommodated in the first end and the lid is separated from the main body, the shower plate is suspended from the plate portion.

公开(公告)号：US20250046645A1

公开(公告)日：2025-02-06

申请号：US17431995

申请日：2020-02-14

Applicant: Tokyo Electron Limited

Inventor： Tamihiro KOBAYASHI ,  Takayuki YAMAGISHI

IPC: H01L21/687 ,  C23C16/505 ,  C23C16/52 ,  H01L21/67 ,  H01L21/677 ,  H01L21/68

Abstract: A substrate processing apparatus includes stages each placing a substrate thereon, support columns supporting the stages, a common base supporting the support columns, and a position adjustment mechanism provided between the base and each support column. The position adjustment mechanism includes: a fixed member on a side of the base; a position adjustment member disposed above the fixed member and adjusting a position of the stage by positioning a base end portion of the support column; and gap height adjustment parts provided at at least three positions surrounding the support column, and mounting the position adjustment member to the fixed member in a state where a gap height between the fixed member and the position adjustment member is adjustable. At least one position adjustment mechanism is provided with a fixedly mounting part mounting the position adjustment member to the fixed member in a state where the gap height is fixed.

公开(公告)号：US20210225618A1

公开(公告)日：2021-07-22

申请号：US17149246

申请日：2021-01-14

Applicant: Tokyo Electron Limited

Inventor： Sumi TANAKA ,  Tamihiro KOBAYASHI

IPC: H01J37/32 ,  C23C16/505 ,  C23C16/458

Abstract: A substrate processing apparatus includes: a processing chamber including a processing room; a heating unit that heats the processing chamber; a support including a base thermally isolated from the processing chamber and fixed to the processing chamber, and a stage inserted into an opening provided toward the processing room while being supported by the base at a position distant from a reference position in a horizontal direction, and holds the substrate in the processing room; a stage peripheral member provided in the processing chamber along a periphery of the stage in a state of being inserted into the opening; and a first positioning pin fixed to the processing chamber to position the stage peripheral member, and a second positioning pin fixed to a position farther than the first positioning pin.

公开(公告)号：US20190385873A1

公开(公告)日：2019-12-19

申请号：US16438781

申请日：2019-06-12

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takayuki YAMAGISHI ,  Tamihiro KOBAYASHI

IPC: H01L21/67 ,  H01L21/677 ,  C23C16/44 ,  C23C16/54 ,  C23C16/455

Abstract: There is provided a vacuum processing apparatus for performing a vacuum process by supplying a processing gas onto a substrate arranged in a processing space kept in a vacuum atmosphere, the apparatus comprising: a first transfer space and a second transfer space in each of which the substrate is transferred; and an intermediate wall portion provided between the first transfer space and the second transfer space along the extension direction, wherein one or more processing spaces are arranged in the first transfer space along the extension direction, and two or more processing spaces are arranged in the second transfer space along the extension direction, and wherein a plurality of exhaust paths and a joined exhaust path where the plurality of exhaust paths are joined are formed in the intermediate wall portion.